James Word
Director at Mentor Graphics Corp
SPIE Involvement:
Author
Publications (63)

Proceedings Article | 14 March 2019
Proc. SPIE. 10957, Extreme Ultraviolet (EUV) Lithography X
KEYWORDS: Extreme ultraviolet, SRAF, Source mask optimization, Image quality, Image processing, Photovoltaics, Photomasks, Metals, Optical proximity correction, Extreme ultraviolet lithography

Proceedings Article | 22 October 2018
Proc. SPIE. 10810, Photomask Technology 2018
KEYWORDS: Photomasks, SRAF, Printing, Lithography, Vestigial sideband modulation, Semiconducting wafers, Optical proximity correction, Manufacturing, Image quality, Image processing

SPIE Journal Paper | 31 July 2018
JM3 Vol. 18 Issue 01
KEYWORDS: SRAF, Photomasks, Metals, Extreme ultraviolet lithography, Personal protective equipment, Photovoltaics, Extreme ultraviolet, Image quality, Source mask optimization, Lithography

Proceedings Article | 20 March 2018
Proc. SPIE. 10583, Extreme Ultraviolet (EUV) Lithography IX
KEYWORDS: Metals, Source mask optimization, Extreme ultraviolet, Optical proximity correction, Optical lithography, Manufacturing, Printing, Extreme ultraviolet lithography, Image processing, Image quality

Proceedings Article | 20 March 2018
Proc. SPIE. 10583, Extreme Ultraviolet (EUV) Lithography IX
KEYWORDS: Extreme ultraviolet, Optical proximity correction, Optical lithography, Photomasks, Source mask optimization, Deep ultraviolet, Printing, Manufacturing, Metals, Image processing

Proceedings Article | 20 March 2018
Proc. SPIE. 10588, Design-Process-Technology Co-optimization for Manufacturability XII
KEYWORDS: Manufacturing, Photomasks, Etching, Model-based design, Optical proximity correction, Double patterning technology, Extreme ultraviolet, Lithography, Printing, Deep ultraviolet

Showing 5 of 63 publications
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