James Word
Director at Mentor, a Siemens Business
SPIE Involvement:
Author
Publications (67)

Proceedings Article | 23 March 2020
Proc. SPIE. 11328, Design-Process-Technology Co-optimization for Manufacturability XIV
KEYWORDS: Design for manufacturing, Image enhancement, Extreme ultraviolet lithography, Optical proximity correction

Proceedings Article | 23 March 2020
Proc. SPIE. 11329, Advanced Etch Technology for Nanopatterning IX
KEYWORDS: Data modeling, Etching, Inspection, Neural networks, Photomasks, Machine learning, Optical proximity correction, Semiconducting wafers, Process modeling

Proceedings Article | 26 March 2019
Proc. SPIE. 10957, Extreme Ultraviolet (EUV) Lithography X
KEYWORDS: Lithography, Image quality, Photomasks, Extreme ultraviolet, Extreme ultraviolet lithography, SRAF

Proceedings Article | 21 March 2019
Proc. SPIE. 10962, Design-Process-Technology Co-optimization for Manufacturability XIII
KEYWORDS: Metrology, Optical lithography, Visualization, Metals, Manufacturing, Scanning electron microscopy, Printing, Photomasks, Extreme ultraviolet, Optical proximity correction

Proceedings Article | 20 March 2019
Proc. SPIE. 10962, Design-Process-Technology Co-optimization for Manufacturability XIII
KEYWORDS: Wafer-level optics, Defect detection, Data modeling, Feature extraction, Machine learning, Optical proximity correction, High volume manufacturing, Semiconducting wafers, Optics manufacturing, Statistical modeling

Showing 5 of 67 publications
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