Dr. Jan-Peter Urbach
at Optics Balzers AG
SPIE Involvement:
Publications (9)

Proceedings Article | 20 August 2004 Paper
Proceedings Volume 5446, (2004) https://doi.org/10.1117/12.557762
KEYWORDS: Photomasks, Lithography, Semiconducting wafers, Semiconductors, Metrology, Wafer-level optics, Image quality, Lithographic illumination, CCD cameras, Binary data

Proceedings Article | 28 May 2004 Paper
Proceedings Volume 5377, (2004) https://doi.org/10.1117/12.536670
KEYWORDS: Photomasks, Phase shifts, Semiconducting wafers, Optical resolution, Lithography, Etching, Binary data, Wafer-level optics, CCD image sensors, Optical simulations

Proceedings Article | 17 December 2003 Paper
Proceedings Volume 5256, (2003) https://doi.org/10.1117/12.518388
KEYWORDS: Inspection, Photomasks, Semiconducting wafers, Extreme ultraviolet lithography, Quartz, Confocal microscopy, Scattering, Particles, Signal detection, Extreme ultraviolet

Proceedings Article | 28 August 2003 Paper
Takashi Yasui, Iwao Higashikawa, Peter Kuschnerus, Thomas Engel, Axel Zibold, Claudia Hertfelder, Yuji Kobiyama, Jan-Peter Urbach, Christof Schilz, Armin Semmler
Proceedings Volume 5130, (2003) https://doi.org/10.1117/12.504215
KEYWORDS: Photomasks, Binary data, CCD image sensors, CCD cameras, Image quality, Semiconducting wafers, Vacuum ultraviolet, Lithography, Vibration control, Optical resolution

Proceedings Article | 28 May 2003 Paper
Peter Kuschnerus, Thomas Engel, Wolfgang Harnisch, Claudia Hertfelder, Axel Zibold, Jan-Peter Urbach, Christof Schilz, Klaus Eisner
Proceedings Volume 5148, (2003) https://doi.org/10.1117/12.514958
KEYWORDS: Photomasks, Lithography, Lithographic illumination, Vacuum ultraviolet, Charge-coupled devices, CCD image sensors, Binary data, Reticles, Image quality, CCD cameras

Showing 5 of 9 publications
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