Dr. Jan-Peter Urbach
at Optics Balzers AG
SPIE Involvement:
Author
Publications (9)

Proceedings Article | 20 August 2004
Proc. SPIE. 5446, Photomask and Next-Generation Lithography Mask Technology XI
KEYWORDS: Wafer-level optics, Semiconductors, Lithography, Metrology, Lithographic illumination, CCD cameras, Image quality, Photomasks, Semiconducting wafers, Binary data

Proceedings Article | 28 May 2004
Proc. SPIE. 5377, Optical Microlithography XVII
KEYWORDS: Wafer-level optics, Lithography, Etching, Optical resolution, Photomasks, Optical simulations, CCD image sensors, Semiconducting wafers, Binary data, Phase shifts

Proceedings Article | 17 December 2003
Proc. SPIE. 5256, 23rd Annual BACUS Symposium on Photomask Technology
KEYWORDS: Confocal microscopy, Scattering, Quartz, Particles, Inspection, Photomasks, Extreme ultraviolet, Extreme ultraviolet lithography, Semiconducting wafers, Signal detection

Proceedings Article | 28 August 2003
Proc. SPIE. 5130, Photomask and Next-Generation Lithography Mask Technology X
KEYWORDS: Lithography, CCD cameras, Image quality, Vibration control, Optical resolution, Photomasks, Vacuum ultraviolet, CCD image sensors, Semiconducting wafers, Binary data

Proceedings Article | 28 May 2003
Proc. SPIE. 5148, 19th European Conference on Mask Technology for Integrated Circuits and Microcomponents
KEYWORDS: Lithography, Reticles, Lithographic illumination, CCD cameras, Image quality, Photomasks, Charge-coupled devices, Vacuum ultraviolet, CCD image sensors, Binary data

Showing 5 of 9 publications
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