Jan-Pieter Kuijten
at ASML Netherlands BV
SPIE Involvement:
Author
Publications (15)

Proceedings Article | 16 October 2017
Proc. SPIE. 10450, International Conference on Extreme Ultraviolet Lithography 2017
KEYWORDS: Reticles, Contamination, Scanners, Inspection, Reflectivity, Oxygen, Pellicles, Photomasks, Extreme ultraviolet, Extreme ultraviolet lithography

Proceedings Article | 20 October 2006
Proc. SPIE. 6349, Photomask Technology 2006
KEYWORDS: Lithography, Apodization, Reticles, Polarization, Spatial frequencies, Pellicles, Photomasks, Optical proximity correction, Critical dimension metrology, Semiconducting wafers

Proceedings Article | 12 May 2005
Proc. SPIE. 5754, Optical Microlithography XVIII
KEYWORDS: Semiconductors, Manufacturing, Chromium, Photoresist materials, Photomasks, Optical proximity correction, Mask making, Nanoimprint lithography, Resolution enhancement technologies, Phase shifts

Proceedings Article | 20 August 2004
Proc. SPIE. 5446, Photomask and Next-Generation Lithography Mask Technology XI
KEYWORDS: Reticles, Quartz, Image processing, Scanning electron microscopy, Photomasks, Optical proximity correction, Mask making, Binary data, Resolution enhancement technologies, Phase shifts

Proceedings Article | 28 May 2004
Proc. SPIE. 5377, Optical Microlithography XVII
KEYWORDS: Semiconductors, Lithography, Reticles, Manufacturing, Scanning electron microscopy, Photomasks, Semiconducting wafers, Binary data, Resolution enhancement technologies, Phase shifts

Showing 5 of 15 publications
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