Jan-Wen You
at Taiwan Semiconductor Manufacturing Co Ltd
SPIE Involvement:
Author
Publications (4)

Proceedings Article | 6 December 2004
Proc. SPIE. 5567, 24th Annual BACUS Symposium on Photomask Technology
KEYWORDS: Phase shifting, Optical lithography, Etching, Quartz, Photomasks, Mask making, Semiconducting wafers, Photomask technology, Phase shifts

Proceedings Article | 20 August 2004
Proc. SPIE. 5446, Photomask and Next-Generation Lithography Mask Technology XI
KEYWORDS: Lithography, Electron beam lithography, Image processing, Laser energy, Scanning electron microscopy, Photomasks, Optical simulations, Optical proximity correction, Convolution, Semiconducting wafers

Proceedings Article | 28 August 2003
Proc. SPIE. 5130, Photomask and Next-Generation Lithography Mask Technology X
KEYWORDS: Etching, Quartz, Chromium, Photomasks, Wet etching, Mask making, Reactive ion etching, Semiconducting wafers, Resolution enhancement technologies, Phase shifts

Proceedings Article | 27 December 2002
Proc. SPIE. 4889, 22nd Annual BACUS Symposium on Photomask Technology
KEYWORDS: Reticles, Optical lithography, Etching, Dry etching, Chromium, Photomasks, Wet etching, Semiconducting wafers, Resolution enhancement technologies, Phase shifts

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