Dr. Jan-Willem Gemmink
Project Leader at ASML Netherlands BV
SPIE Involvement:
Publications (10)

Proceedings Article | 28 March 2017 Paper
Proceedings Volume 10145, 1014514 (2017) https://doi.org/10.1117/12.2257876
KEYWORDS: Etching, Metrology, Lithography, Scanning electron microscopy, Inspection, Process control, Manufacturing, Process engineering, Chemical mechanical planarization, Copper, Semiconducting wafers, Metals, Image processing, Optical alignment

Proceedings Article | 16 March 2016 Paper
Proceedings Volume 9781, 97810S (2016) https://doi.org/10.1117/12.2219143
KEYWORDS: Scanners, Design for manufacturability, Manufacturing, Product engineering, Reticles, Visualization, Image resolution, Chemical mechanical planarization, Sensors, Time metrology, Data modeling, Semiconducting wafers, Optical lithography, Performance modeling, Photomasks

Proceedings Article | 23 March 2011 Paper
Proceedings Volume 7973, 79730V (2011) https://doi.org/10.1117/12.881609
KEYWORDS: Calibration, Semiconducting wafers, Scanners, Reticles, Monochromatic aberrations, Photomasks, HVAC controls, Manufacturing, Diffraction, Wavefronts

Proceedings Article | 23 March 2011 Paper
Proceedings Volume 7973, 79730R (2011) https://doi.org/10.1117/12.881606
KEYWORDS: Semiconducting wafers, Scanners, Fiber optic illuminators, Critical dimension metrology, Scatterometry, Diffractive optical elements, Scanning electron microscopy, Wafer-level optics, Photomasks, Control systems

Proceedings Article | 19 March 2008 Paper
Ewoud Vreugdenhil, Harold Benten, Liesbeth Reijnen, Gerald Dicker, Jan-Willem Gemmink, Frank Bornebroek
Proceedings Volume 6925, 69250D (2008) https://doi.org/10.1117/12.771998
KEYWORDS: Photomasks, Optical lithography, Nanoimprint lithography, Transistors, Lithography, Curium, Printing, Field effect transistors, Scanners, Semiconducting wafers

Showing 5 of 10 publications
Conference Committee Involvement (1)
Optical Microlithography XX
27 February 2007 | San Jose, California, United States
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