Dr. Jan-Willem Gemmink
at ASML Netherlands BV
SPIE Involvement:
Conference Program Committee | Author
Publications (10)

PROCEEDINGS ARTICLE | March 28, 2017
Proc. SPIE. 10145, Metrology, Inspection, and Process Control for Microlithography XXXI
KEYWORDS: Lithography, Metrology, Etching, Metals, Image processing, Copper, Manufacturing, Inspection, Scanning electron microscopy, Process control, Optical alignment, Semiconducting wafers, Process engineering, Chemical mechanical planarization

PROCEEDINGS ARTICLE | March 16, 2016
Proc. SPIE. 9781, Design-Process-Technology Co-optimization for Manufacturability X
KEYWORDS: Reticles, Optical lithography, Data modeling, Visualization, Sensors, Scanners, Manufacturing, Image resolution, Time metrology, Photomasks, Semiconducting wafers, Product engineering, Performance modeling, Chemical mechanical planarization, Design for manufacturability

PROCEEDINGS ARTICLE | March 23, 2011
Proc. SPIE. 7973, Optical Microlithography XXIV
KEYWORDS: Diffraction, Monochromatic aberrations, Reticles, Calibration, Scanners, Manufacturing, Wavefronts, Photomasks, Semiconducting wafers, HVAC controls

PROCEEDINGS ARTICLE | March 23, 2011
Proc. SPIE. 7973, Optical Microlithography XXIV
KEYWORDS: Wafer-level optics, Diffractive optical elements, Scanners, Control systems, Scanning electron microscopy, Scatterometry, Photomasks, Critical dimension metrology, Semiconducting wafers, Fiber optic illuminators

PROCEEDINGS ARTICLE | March 19, 2008
Proc. SPIE. 6925, Design for Manufacturability through Design-Process Integration II
KEYWORDS: Lithography, Optical lithography, Curium, Scanners, Printing, Photomasks, Transistors, Field effect transistors, Nanoimprint lithography, Semiconducting wafers

PROCEEDINGS ARTICLE | April 2, 2007
Proc. SPIE. 6520, Optical Microlithography XX
KEYWORDS: Semiconductors, Lithography, Refractive index, Polarization, Water, Manufacturing, Imaging devices, Photoresist materials, Photomasks, Photoresist developing

Showing 5 of 10 publications
Conference Committee Involvement (1)
Optical Microlithography XX
27 February 2007 | San Jose, California, United States
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