Mr. Jan F. W. Cavelaars
at SUNY Poly SEMATECH
SPIE Involvement:
Author
Publications (2)

PROCEEDINGS ARTICLE | May 10, 2005
Proc. SPIE. 5752, Metrology, Inspection, and Process Control for Microlithography XIX
KEYWORDS: Multilayers, Metrology, Spatial frequencies, Particles, Inspection, Reflectivity, Photomasks, Extreme ultraviolet, Extreme ultraviolet lithography, Defect inspection

PROCEEDINGS ARTICLE | December 17, 2003
Proc. SPIE. 5256, 23rd Annual BACUS Symposium on Photomask Technology
KEYWORDS: Confocal microscopy, Scattering, Quartz, Particles, Inspection, Photomasks, Extreme ultraviolet, Extreme ultraviolet lithography, Semiconducting wafers, Signal detection

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