Jan V. Hermans
at IMEC
SPIE Involvement:
Author
Publications (28)

PROCEEDINGS ARTICLE | March 20, 2018
Proc. SPIE. 10589, Advanced Etch Technology for Nanopatterning VII
KEYWORDS: Actuators, Optical lithography, Contamination, Etching, Scanners, Copper, Scanning electron microscopy, Semiconducting wafers, Overlay metrology, Tin

PROCEEDINGS ARTICLE | March 20, 2018
Proc. SPIE. 10587, Optical Microlithography XXXI
KEYWORDS: Polarization, Sensors, Etching, Scanners, Monte Carlo methods, Optical alignment, Overlay metrology, Chemical mechanical planarization

PROCEEDINGS ARTICLE | March 24, 2017
Proc. SPIE. 10143, Extreme Ultraviolet (EUV) Lithography VIII
KEYWORDS: Lithography, Etching, Photomasks, Extreme ultraviolet, Plasma enhanced chemical vapor deposition, Plasma etching, Extreme ultraviolet lithography, High volume manufacturing, Reactive ion etching, Stochastic processes, Focus stacking software

PROCEEDINGS ARTICLE | July 28, 2014
Proc. SPIE. 9256, Photomask and Next-Generation Lithography Mask Technology XXI
KEYWORDS: Reticles, Scanners, Particles, Inspection, Printing, Photomasks, Extreme ultraviolet, Bismuth, Extreme ultraviolet lithography, Semiconducting wafers

PROCEEDINGS ARTICLE | April 12, 2013
Proc. SPIE. 8683, Optical Microlithography XXVI
KEYWORDS: Optical lithography, Etching, Metals, Scanners, Copper, Double patterning technology, Optical alignment, Neodymium, Chemical mechanical planarization, Back end of line

PROCEEDINGS ARTICLE | April 1, 2013
Proc. SPIE. 8679, Extreme Ultraviolet (EUV) Lithography IV
KEYWORDS: Image processing, Coating, Inspection, Extreme ultraviolet, Line width roughness, Extreme ultraviolet lithography, Photoresist processing, Semiconducting wafers, Standards development, Plasma

Showing 5 of 28 publications
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