Jan V. Hermans
at imec
SPIE Involvement:
Author
Publications (33)

Proceedings Article | 12 October 2020 Poster + Paper
Proc. SPIE. 11518, Photomask Technology 2020
KEYWORDS: Diffraction, Reticles, Metrology, Logic, Sensors, Etching, Scanners, Photomasks, Optical alignment, Overlay metrology

Proceedings Article | 23 March 2020 Paper
Proc. SPIE. 11329, Advanced Etch Technology for Nanopatterning IX
KEYWORDS: Metrology, Etching, Scanners, Ions, Optical alignment, Semiconducting wafers, Overlay metrology

Proceedings Article | 26 September 2019 Paper
Proc. SPIE. 11148, Photomask Technology 2019
KEYWORDS: Reticles, Sensors, Scanners, Image registration, Photomasks, Optical alignment, Semiconducting wafers, Overlay metrology

Proceedings Article | 27 June 2019 Paper
Proc. SPIE. 11178, Photomask Japan 2019: XXVI Symposium on Photomask and Next-Generation Lithography Mask Technology
KEYWORDS: Reticles, Metrology, Sensors, Etching, Scanners, Image registration, Photomasks, Optical alignment, Semiconducting wafers, Overlay metrology

Proceedings Article | 26 March 2019 Paper
Proc. SPIE. 10959, Metrology, Inspection, and Process Control for Microlithography XXXIII
KEYWORDS: Etching, Scanners, Annealing, Silicon, Distortion, Silicon films, Optical alignment, Semiconducting wafers, Performance modeling, Overlay metrology

Showing 5 of 33 publications
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