Jan V. Hermans
at IMEC
SPIE Involvement:
Author
Publications (28)

PROCEEDINGS ARTICLE | March 20, 2018
Proc. SPIE. 10589, Advanced Etch Technology for Nanopatterning VII
KEYWORDS: Semiconducting wafers, Etching, Overlay metrology, Scanners, Scanning electron microscopy, Optical lithography, Contamination, Actuators, Tin, Copper

PROCEEDINGS ARTICLE | March 20, 2018
Proc. SPIE. 10587, Optical Microlithography XXXI
KEYWORDS: Optical alignment, Monte Carlo methods, Overlay metrology, Polarization, Sensors, Chemical mechanical planarization, Etching, Scanners

PROCEEDINGS ARTICLE | March 24, 2017
Proc. SPIE. 10143, Extreme Ultraviolet (EUV) Lithography VIII
KEYWORDS: Extreme ultraviolet lithography, Etching, Extreme ultraviolet, Lithography, High volume manufacturing, Stochastic processes, Plasma etching, Reactive ion etching, Plasma enhanced chemical vapor deposition, Focus stacking software, Photomasks

PROCEEDINGS ARTICLE | July 28, 2014
Proc. SPIE. 9256, Photomask and Next-Generation Lithography Mask Technology XXI
KEYWORDS: Photomasks, Extreme ultraviolet, Reticles, Semiconducting wafers, Particles, Inspection, Extreme ultraviolet lithography, Bismuth, Printing, Scanners

PROCEEDINGS ARTICLE | April 12, 2013
Proc. SPIE. 8683, Optical Microlithography XXVI
KEYWORDS: Optical alignment, Etching, Back end of line, Metals, Copper, Double patterning technology, Chemical mechanical planarization, Scanners, Neodymium, Optical lithography

PROCEEDINGS ARTICLE | April 1, 2013
Proc. SPIE. 8679, Extreme Ultraviolet (EUV) Lithography IV
KEYWORDS: Photoresist processing, Semiconducting wafers, Extreme ultraviolet, Line width roughness, Standards development, Extreme ultraviolet lithography, Coating, Inspection, Image processing, Plasma

Showing 5 of 28 publications
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