Dr. Jan P. Heumann
Member of Technicall Staff at Advanced Mask Technology Ctr GmbH Co KG
SPIE Involvement:
Author
Publications (28)

Proceedings Article | 27 June 2019 Paper
Proc. SPIE. 11178, Photomask Japan 2019: XXVI Symposium on Photomask and Next-Generation Lithography Mask Technology
KEYWORDS: Defect detection, Opacity, Inspection, Optical inspection, Photomasks, Extreme ultraviolet, Extreme ultraviolet lithography, Critical dimension metrology, Signal detection, Defect inspection

Proceedings Article | 12 October 2018 Presentation
Proc. SPIE. 10810, Photomask Technology 2018
KEYWORDS: Wafer-level optics, Lithography, Defect detection, Inspection, Optical inspection, Photomasks, Extreme ultraviolet, Extreme ultraviolet lithography, Semiconducting wafers, EUV optics

Proceedings Article | 3 October 2018 Presentation + Paper
Proc. SPIE. 10810, Photomask Technology 2018
KEYWORDS: Defect detection, Polarization, Inspection, Optical inspection, Inspection equipment, Photomasks, Extreme ultraviolet, Semiconducting wafers, EUV optics, Defect inspection

Proceedings Article | 12 June 2018 Paper
Proc. SPIE. 10807, Photomask Japan 2018: XXV Symposium on Photomask and Next-Generation Lithography Mask Technology
KEYWORDS: Defect detection, Deep ultraviolet, Polarization, Opacity, Inspection, Photomasks, Extreme ultraviolet, Critical dimension metrology, EUV optics, Defect inspection

Proceedings Article | 8 November 2012 Paper
Proc. SPIE. 8522, Photomask Technology 2012
KEYWORDS: Data modeling, Manufacturing, Inspection, Control systems, Scanning electron microscopy, Photomasks, Spatial resolution, Critical dimension metrology, Semiconducting wafers, Defect inspection

Showing 5 of 28 publications
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