Dr. Jan Mulkens
Program System Engineer at
SPIE Involvement:
Author
Publications (39)

PROCEEDINGS ARTICLE | October 18, 2018
Proc. SPIE. 10810, Photomask Technology 2018
KEYWORDS: Metrology, Liquid phase epitaxy, Error analysis, Inspection, Photomasks, Extreme ultraviolet, Cadmium sulfide, Nanoimprint lithography, Critical dimension metrology, Semiconducting wafers

PROCEEDINGS ARTICLE | March 13, 2018
Proc. SPIE. 10585, Metrology, Inspection, and Process Control for Microlithography XXXII
KEYWORDS: Lithography, Electron beams, Metrology, Logic, Scanners, Extreme ultraviolet lithography, Optical proximity correction, Critical dimension metrology, Semiconducting wafers, Overlay metrology

PROCEEDINGS ARTICLE | March 28, 2017
Proc. SPIE. 10145, Metrology, Inspection, and Process Control for Microlithography XXXI
KEYWORDS: Lithography, Metrology, Optical lithography, Scanners, Control systems, Process control, Extreme ultraviolet, Line width roughness, Extreme ultraviolet lithography, Immersion lithography, Logic devices, Optical proximity correction, Critical dimension metrology, Line edge roughness, Semiconducting wafers, Overlay metrology

SPIE Journal Paper | March 29, 2016
JM3 Vol. 15 Issue 02
KEYWORDS: Overlay metrology, Metrology, Distortion, Control systems, Semiconducting wafers, Scanners, Etching, Information technology, Image processing, Photomasks

PROCEEDINGS ARTICLE | March 25, 2016
Proc. SPIE. 9778, Metrology, Inspection, and Process Control for Microlithography XXX
KEYWORDS: Target detection, Metrology, Lithium, Scanners, Time metrology, Process control, Optical alignment, Semiconducting wafers, Overlay metrology, Process modeling

PROCEEDINGS ARTICLE | March 15, 2016
Proc. SPIE. 9780, Optical Microlithography XXIX
KEYWORDS: Lithography, Metrology, Logic, Optical lithography, Etching, Scanners, Scatterometry, Process control, Photomasks, Plasma etching, Critical dimension metrology

Showing 5 of 39 publications
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