Mr. Jan Ronsmans
Senior Application Engineer at JSR Micro Materials Innovation
SPIE Involvement:
Author
Publications (1)

PROCEEDINGS ARTICLE | April 15, 2008
Proc. SPIE. 6923, Advances in Resist Materials and Processing Technology XXV
KEYWORDS: Optical lithography, Polymers, Fourier transforms, Electroluminescence, Photoresist materials, Absorbance, Critical dimension metrology, Line edge roughness, Photoresist processing, Resolution enhancement technologies

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