In this work, we show how to predict the polarization-performance of high-numerical aperture optical systems. Various important influences, such as coating-induced phase change, stress induced birefringence, or the quality of the raw material are investigated.
Optical systems for lithography (projection lens), inspection (micro-objectives) or laser material processing usually have tight specifications regarding focus and wave-front stability. The same is true regarding the field dependent properties. Especially projection lenses have tight specifications on field curvature, magnification and distortion. Unwanted heating either from internal or external sources lead to undesired changes of the above properties. In this work we show an elegant and fast method to analyze the thermal sensitivity using ZEMAX. The key point of this method is using the thermal changes of the lens data from the multi-configuration editor as starting point for a (standard) tolerance analysis. Knowing the sensitivity we can either define requirements on the environment or use it to systematically improve the thermal behavior of the lens. We demonstrate this method for a typical projection lens for which we optimized the thermal field curvature to a minimum.
The position stability of optical elements is an essential part of the tolerance budget of an optical system because its compensation would require an alignment step after the lens has left the factory. In order to achieve a given built performance the stability error contribution needs to be known and accounted for. Given a high-end lens touching the edge of technology not knowing, under- or overestimating this contribution becomes a serious cost and risk factor. If overestimated the remaining parts of the budget need to be tighter. If underestimated the total project might fail. For many mounting principles the stability benchmark is based on previous systems or information gathered by elaborated testing of complete optical systems. This renders the development of a new system into a risky endeavour, because these experiences are not sufficiently precise and tend to be not transferable when scaling of the optical elements is intended. This contribution discusses the influences of different optical mounting concepts on the position stability using the example of high numerical aperture (HNA) inspection lenses working in the deep ultraviolet (DUV) spectrum. A method to investigate the positional stability is presented for selected mounting examples typical for inspection lenses.
Along the course of increasing through-put and improving signal to noise ratio in optical wafer and mask inspection, demands on wave front aberrations and polarization characteristics are ever increasing. The system engineers and optical designers involved in the development of such optical systems will be responsible for specifying the quality of the optical material and the mechanical tolerances. Among optical designers it is well established how to estimate the wave front error of assembled and adjusted optical devices via sensitivity or Monte-Carlo analysis. However, when compared with the scalar problem of wave front estimation, the field of polarization control deems to pose a more complex problem due to its vectorial nature. Here we show our latest results in how to model polarization affecting aspects. In the realm of high numerical aperture (NA) inspection optics we will focus on the impact of coatings, stress induced birefringence due to non-perfect lens mounting, and finally the birefringence of the optical material. With all these tools at hand, we have a more complete understanding of the optical performance of our assembled optical systems. Moreover, we are able to coherently develop optical systems meeting demanding wave front criteria as well as high end polarization specifications.
In this work, we investigate how and to which extent a quantum system can be driven along a prescribed path in space by a suitably tailored laser pulse. The laser field is calculated with the help of quantum optimal control theory employing a time-dependent formulation for the control target. Within a two-dimensional (2D) model system we have successfully optimized laser fields for two distinct charge transfer processes. The resulting laser fields can be understood as a complicated interplay of different excitation and de-excitation processes in the quantum system.