Dr. Jan Van Schoot
Senior Principal Architect at ASML Netherlands BV
SPIE Involvement:
Author
Publications (43)

Proceedings Article | 23 March 2020
Proc. SPIE. 11323, Extreme Ultraviolet (EUV) Lithography XI
KEYWORDS: Scanners, Particles, Photoresist materials, Photomasks, Extreme ultraviolet, Line width roughness, Extreme ultraviolet lithography, Semiconducting wafers, Optics manufacturing, Stochastic processes

Proceedings Article | 23 March 2020
Proc. SPIE. 11323, Extreme Ultraviolet (EUV) Lithography XI
KEYWORDS: Lithography, Mirrors, Metrology, Lithographic illumination, Projection systems, Light sources and illumination, Extreme ultraviolet, Extreme ultraviolet lithography, Optics manufacturing, EUV optics

Proceedings Article | 16 October 2019
Proc. SPIE. 11147, International Conference on Extreme Ultraviolet Lithography 2019
KEYWORDS: Mirrors, Optical design, Lithographic illumination, Imaging systems, Scanners, Projection systems, Extreme ultraviolet, Extreme ultraviolet lithography, Double patterning technology, EUV optics

Proceedings Article | 16 October 2019
Proc. SPIE. 11147, International Conference on Extreme Ultraviolet Lithography 2019
KEYWORDS: Thermography, Sensors, Scanners, Lens design, Pellicles, Photomasks, Extreme ultraviolet lithography, High volume manufacturing

Proceedings Article | 29 August 2019
Proc. SPIE. 11177, 35th European Mask and Lithography Conference (EMLC 2019)
KEYWORDS: Optical imaging, Lithography, Diffraction, Lithographic illumination, Scanners, Projection systems, Extreme ultraviolet, Extreme ultraviolet lithography, Computational lithography, Projection lithography, EUV optics

Showing 5 of 43 publications
SIGN IN TO:
  • View contact details

UPDATE YOUR PROFILE
Is this your profile? Update it now.
Don’t have a profile and want one?

Advertisement
Advertisement
Back to Top