Dr. Jangho Shin
Senior field apps engineer at ASML
SPIE Involvement:
Senior status | Author
Area of Expertise:
Semiconductor Processing , Optical Lithography , Alignment , Overlay Metrology , Computational lithography , Defect inspection metrology
Profile Summary

Jangho (Jerry) Shin is presently a senior field apps engineer at ASML Korea. He was a researcher/manager at Samsung semiconductor R&D and is a Senior member of SPIE. Dr. Shin received his PhD in electrical and computer engineering from the University of Wisconsin at Madison in 2003.
Publications (18)

PROCEEDINGS ARTICLE | March 28, 2017
Proc. SPIE. 10145, Metrology, Inspection, and Process Control for Microlithography XXXI
KEYWORDS: Electron beam lithography, Metrology, Defect detection, Metals, Scanners, Inspection, Scanning electron microscopy, Photomasks, Critical dimension metrology, Semiconducting wafers

PROCEEDINGS ARTICLE | March 24, 2017
Proc. SPIE. 10147, Optical Microlithography XXX
KEYWORDS: Metrology, Lithographic illumination, Data modeling, Calibration, Image processing, Scanners, Laser scanners, Process control, Finite element methods, Photomasks, Computational lithography, 3D scanning, Critical dimension metrology, Semiconducting wafers

SPIE Journal Paper | July 1, 2010
JM3 Vol. 9 Issue 03

PROCEEDINGS ARTICLE | April 2, 2010
Proc. SPIE. 7638, Metrology, Inspection, and Process Control for Microlithography XXIV
KEYWORDS: Semiconductors, Lithography, Metrology, Optical lithography, Data modeling, Scanners, Inspection, Optical alignment, Semiconducting wafers, Overlay metrology

SPIE Journal Paper | July 1, 2009
JM3 Vol. 8 Issue 03
KEYWORDS: Semiconducting wafers, Overlay metrology, Scanners, Semiconductors, Optical alignment, Optical lithography, Metrology, Process control, Source mask optimization, Electronics

PROCEEDINGS ARTICLE | March 23, 2009
Proc. SPIE. 7272, Metrology, Inspection, and Process Control for Microlithography XXIII
KEYWORDS: Semiconductors, Reticles, Metrology, Optical lithography, Scanners, Process control, Source mask optimization, Optical alignment, Semiconducting wafers, Overlay metrology

Showing 5 of 18 publications
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