Dr. Janko Versluijs
at IMEC
SPIE Involvement:
Author
Publications (17)

PROCEEDINGS ARTICLE | March 23, 2018
Proc. SPIE. 10583, Extreme Ultraviolet (EUV) Lithography IX
KEYWORDS: Optical lithography, Etching, Metals, Copper, Resistance, Photomasks, Extreme ultraviolet, Critical dimension metrology, Semiconducting wafers, Tin

PROCEEDINGS ARTICLE | March 20, 2018
Proc. SPIE. 10589, Advanced Etch Technology for Nanopatterning VII
KEYWORDS: Oxides, Etching, Metals, Dielectrics, Scanning electron microscopy, Photoresist materials, Line edge roughness

PROCEEDINGS ARTICLE | March 21, 2016
Proc. SPIE. 9779, Advances in Patterning Materials and Processes XXXIII
KEYWORDS: Semiconductors, Optical lithography, Etching, Error analysis, Manufacturing, Inspection, Scanning electron microscopy, Process control, Wafer inspection, Plasma etching, Error control coding, Semiconducting wafers, System on a chip, Overlay metrology, Device simulation, Tin

PROCEEDINGS ARTICLE | March 17, 2015
Proc. SPIE. 9428, Advanced Etch Technology for Nanopatterning IV
KEYWORDS: Oxides, Carbon, Lithography, Optical lithography, Etching, Photomasks, Double patterning technology, Semiconducting wafers, System on a chip, Tin

SPIE Journal Paper | September 4, 2013
JM3 Vol. 12 Issue 04
KEYWORDS: Line width roughness, Optical lithography, Etching, Line edge roughness, Photomasks, Silicon, Extreme ultraviolet lithography, Plasma, Plasma enhanced chemical vapor deposition, Lithography

PROCEEDINGS ARTICLE | April 12, 2013
Proc. SPIE. 8683, Optical Microlithography XXVI
KEYWORDS: Lithography, Optical lithography, Etching, Ions, Manufacturing, Extreme ultraviolet, Extreme ultraviolet lithography, Double patterning technology, Semiconducting wafers, Design for manufacturability

Showing 5 of 17 publications
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