Jason R. Cantone
Regional Manager
SPIE Involvement:
Publications (12)

Proceedings Article | 28 March 2017
Proc. SPIE. 10145, Metrology, Inspection, and Process Control for Microlithography XXXI
KEYWORDS: Electron beam lithography, Metrology, Optical lithography, Image processing, Manufacturing, Inspection, Image resolution, Scanning electron microscopy, Process control, Dimensional metrology, Critical dimension metrology, Semiconducting wafers, Overlay metrology, Defect inspection

Proceedings Article | 18 March 2016
Proc. SPIE. 9776, Extreme Ultraviolet (EUV) Lithography VII
KEYWORDS: Lithography, Optical lithography, Monte Carlo methods, Photomasks, Extreme ultraviolet, Transistors, Extreme ultraviolet lithography, Critical dimension metrology, EUV optics, Personal protective equipment

Proceedings Article | 2 April 2014
Proc. SPIE. 9050, Metrology, Inspection, and Process Control for Microlithography XXVIII
KEYWORDS: Metrology, Super resolution, Image processing, Image resolution, Distortion, Scanning electron microscopy, Image quality, Image enhancement, Semiconducting wafers, Lawrencium

Proceedings Article | 28 March 2014
Proc. SPIE. 9049, Alternative Lithographic Technologies VI
KEYWORDS: Polymethylmethacrylate, Defect detection, Etching, Image processing, Silicon, 3D modeling, Scatterometry, Directed self assembly, Line edge roughness, Semiconducting wafers

Proceedings Article | 20 March 2012
Proc. SPIE. 8325, Advances in Resist Materials and Processing Technology XXIX
KEYWORDS: Roads, Etching, Polymers, Image processing, Scanning electron microscopy, Optical proximity correction, Reactive ion etching, Neodymium, Semiconducting wafers, Photoresist developing

Showing 5 of 12 publications
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