Dr. Jason O. Clevenger Profile

Dr. Jason O. Clevenger

Principal Scientist at Exponent Inc

SPIE Involvement:

Author

Proceedings Article | 18 February 2008 Paper

Understanding and improving longevity in RF MEMS capacitive switches

Chuck Goldsmith, David Forehand, Derek Scarbrough, Zheng Peng, Cris Palego, James Hwang, Jason Clevenger

Proceedings Volume 6884, 688403 (2008) https://doi.org/10.1117/12.770586

KEYWORDS: Switches, Dielectrics, Microelectromechanical systems, Reliability, Accelerated life testing, Diagnostics, Signal detection, Packaging, Sensors, Electrodes

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Proceedings Article | 17 December 2003 Paper

Plasma and flow modeling of photomask etch chambers

Edward Hammond, Jason Clevenger, Melisa Buie

Proceedings Volume 5256, (2003) https://doi.org/10.1117/12.518200

KEYWORDS: Chlorine, Oxygen, Plasma, Electrons, Etching, Photomasks, Ions, Data modeling, Plasma etching, Particles

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Proceedings Article | 17 December 2003 Paper

Examination of various endpoint methods for chrome mask etch

Corey Collard, Scott Anderson, Rex Anderson, Jason Clevenger, Monika Halim, Cynthia Brooks, Melisa Buie, Turgut Sahin

Proceedings Volume 5256, (2003) https://doi.org/10.1117/12.519188

KEYWORDS: Principal component analysis, Etching, Signal to noise ratio, Chromium, Calibration, Spectroscopy, Photomasks, Charge-coupled devices, Photoresist processing, Neural networks

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Proceedings Article | 17 December 2003 Paper

Optimization of a 65-nm alternating phase-shift quartz etch process

Scott Anderson, Rex Anderson, Melisa Buie, Madhavi Chandrachood, Jason Clevenger, Yvette Lee, Nicole Sandlin, Jian Ding

Proceedings Volume 5256, (2003) https://doi.org/10.1117/12.518231

KEYWORDS: Etching, Reactive ion etching, Photomasks, Quartz, Ions, Phase measurement, Plasma, Phase shifts, Diffractive optical elements, Statistical analysis

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Proceedings Article | 17 December 2003 Paper

Optimization of chrome dry etch in Tetra II using asymmetrically loaded patterns

Cynthia Brooks, Rex Anderson, Jason Clevenger, Corey Collard, Monika Halim, Turgut Sahin, Alfred Mak

Proceedings Volume 5256, (2003) https://doi.org/10.1117/12.519625

KEYWORDS: Etching, Critical dimension metrology, Photomasks, Reticles, Data modeling, Semiconducting wafers, Prototyping, Dry etching, Diffractive optical elements, Chlorine

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Proceedings Article | 28 August 2003 Paper

Effect of chamber seasoning on the chrome dry etch process

Jason Clevenger, Melisa Buie, Nicole Sandlin

Proceedings Volume 5130, (2003) https://doi.org/10.1117/12.504053

KEYWORDS: Etching, Chromium, Photomasks, Semiconducting wafers, Plasma, Chemistry, Plasma etching, Signal detection, Dry etching, Aluminum

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Proceedings Article | 28 May 2003 Paper

Optical emission endpoint optimization in the tetra etch chamber for production of embedded phase-shift photomasks

Cynthia Brooks, Scott Anderson, Rex Anderson, Corey Collard, Jason Clevenger, Nicole Sandlin, Melisa Buie

Proceedings Volume 5148, (2003) https://doi.org/10.1117/12.515073

KEYWORDS: Etching, Photomasks, Molybdenum, Phase shifts, Quartz, Fluorine, Chemistry, Optical lithography, Emission spectroscopy, Phase measurement

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Showing 5 of 7 publications

Conference Committee Involvement (4)

Reliability, Packaging, Testing, and Characterization of MEMS/MOEMS and Nanodevices IX

25 January 2010 | San Francisco, California, United States

Reliability, Packaging, Testing, and Characterization of MEMS/MOEMS and Nanodevices VIII

28 January 2009 | San Jose, California, United States

Reliability, Packaging, Testing, and Characterization of MEMS/MOEMS VII

21 January 2008 | San Jose, California, United States

Reliability, Packaging, Testing, and Characterization of MEMS/MOEMS VI

23 January 2007 | San Jose, California, United States

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