Dr. Jason O. Clevenger Profile

Dr. Jason O. Clevenger

Principal Scientist at Exponent Inc

SPIE Involvement:

Conference Program Committee | Author

Publications (7)

PROCEEDINGS ARTICLE | February 18, 2008

Understanding and improving longevity in RF MEMS capacitive switches

Proc. SPIE. 6884, Reliability, Packaging, Testing, and Characterization of MEMS/MOEMS VII

KEYWORDS: Microelectromechanical systems, Packaging, Accelerated life testing, Switches, Sensors, Electrodes, Dielectrics, Reliability, Diagnostics, Signal detection

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PROCEEDINGS ARTICLE | December 17, 2003

Optimization of a 65-nm alternating phase-shift quartz etch process

Proc. SPIE. 5256, 23rd Annual BACUS Symposium on Photomask Technology

KEYWORDS: Statistical analysis, Diffractive optical elements, Etching, Quartz, Ions, Photomasks, Phase measurement, Reactive ion etching, Plasma, Phase shifts

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PROCEEDINGS ARTICLE | December 17, 2003

Optimization of chrome dry etch in Tetra II using asymmetrically loaded patterns

Proc. SPIE. 5256, 23rd Annual BACUS Symposium on Photomask Technology

KEYWORDS: Reticles, Diffractive optical elements, Data modeling, Etching, Dry etching, Photomasks, Critical dimension metrology, Chlorine, Semiconducting wafers, Prototyping

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PROCEEDINGS ARTICLE | December 17, 2003

Examination of various endpoint methods for chrome mask etch

Proc. SPIE. 5256, 23rd Annual BACUS Symposium on Photomask Technology

KEYWORDS: Signal to noise ratio, Principal component analysis, Calibration, Etching, Spectroscopy, Chromium, Neural networks, Photomasks, Charge-coupled devices, Photoresist processing

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PROCEEDINGS ARTICLE | December 17, 2003

Plasma and flow modeling of photomask etch chambers

Proc. SPIE. 5256, 23rd Annual BACUS Symposium on Photomask Technology

KEYWORDS: Data modeling, Etching, Particles, Electrons, Ions, Oxygen, Photomasks, Plasma etching, Chlorine, Plasma

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PROCEEDINGS ARTICLE | August 28, 2003

Effect of chamber seasoning on the chrome dry etch process

Proc. SPIE. 5130, Photomask and Next-Generation Lithography Mask Technology X

KEYWORDS: Etching, Dry etching, Chemistry, Chromium, Photomasks, Aluminum, Plasma etching, Semiconducting wafers, Signal detection, Plasma

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PROCEEDINGS ARTICLE | May 28, 2003

Optical emission endpoint optimization in the tetra etch chamber for production of embedded phase-shift photomasks

Proc. SPIE. 5148, 19th European Conference on Mask Technology for Integrated Circuits and Microcomponents

KEYWORDS: Optical lithography, Etching, Quartz, Chemistry, Emission spectroscopy, Photomasks, Phase measurement, Molybdenum, Fluorine, Phase shifts

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Showing 5 of 7 publications

Conference Committee Involvement (4)

Reliability, Packaging, Testing, and Characterization of MEMS/MOEMS and Nanodevices IX

25 January 2010 | San Francisco, California, United States

Reliability, Packaging, Testing, and Characterization of MEMS/MOEMS and Nanodevices VIII

28 January 2009 | San Jose, California, United States

Reliability, Packaging, Testing, and Characterization of MEMS/MOEMS VII

21 January 2008 | San Jose, California, United States

Reliability, Packaging, Testing, and Characterization of MEMS/MOEMS VI

23 January 2007 | San Jose, California, United States

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