Mr. Jason D. Hintersteiner
at ASML Wilton
SPIE Involvement:
Author
Publications (5)

PROCEEDINGS ARTICLE | March 24, 2006
Proc. SPIE. 6151, Emerging Lithographic Technologies X
KEYWORDS: Diffraction, Mirrors, Calibration, Spatial light modulators, Photomasks, Transistors, Optical proximity correction, Maskless lithography, Optimization (mathematics), Semiconducting wafers

PROCEEDINGS ARTICLE | May 6, 2005
Proc. SPIE. 5751, Emerging Lithographic Technologies IX
KEYWORDS: Diffraction, Mirrors, Modulation, Spatial light modulators, Transmittance, Photomasks, Maskless lithography, Nanoimprint lithography, Critical dimension metrology, Semiconducting wafers

SPIE Journal Paper | January 1, 2005
JM3 Vol. 4 Issue 01
KEYWORDS: Mirrors, Spatial light modulators, Reticles, Maskless lithography, Photomasks, Semiconducting wafers, Scanners, Wafer-level optics, Lithography, Raster graphics

PROCEEDINGS ARTICLE | May 28, 2004
Proc. SPIE. 5377, Optical Microlithography XVII
KEYWORDS: Lithography, Mirrors, Optical design, Reticles, Calibration, Scanners, Spatial light modulators, Projection systems, Maskless lithography, Semiconducting wafers

PROCEEDINGS ARTICLE | December 17, 2003
Proc. SPIE. 5256, 23rd Annual BACUS Symposium on Photomask Technology
KEYWORDS: Diffraction, Mirrors, Imaging systems, Light scattering, Spatial light modulators, Near field, Photomasks, Maskless lithography, Electromagnetism, Electromagnetic scattering

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