Jason Lee
Principal Engineer at Cymer LLC
SPIE Involvement:
Author
Publications (2)

PROCEEDINGS ARTICLE | March 23, 2011
Proc. SPIE. 7973, Optical Microlithography XXIV
KEYWORDS: Chromatic aberrations, Lithography, Metrology, Optical lithography, Laser drilling, Electroluminescence, Photomasks, Immersion lithography, Critical dimension metrology, Semiconducting wafers

PROCEEDINGS ARTICLE | May 12, 2004
Proc. SPIE. 5754, Optical Microlithography XVIII
KEYWORDS: Lithography, Lithographic illumination, Scanners, Photomasks, Optical proximity correction, SRAF, Critical dimension metrology, Semiconducting wafers, Resolution enhancement technologies, Phase shifts

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