Jason Mayer
at GLOBALFOUNDRIES Inc
SPIE Involvement:
Author
Publications (4)

Proceedings Article | 24 May 2004
Proc. SPIE. 5375, Metrology, Inspection, and Process Control for Microlithography XVIII
KEYWORDS: Scatterometry, Semiconducting wafers, Scatter measurement, Scanning electron microscopy, Critical dimension metrology, Metrology, Manufacturing, Electrodes, Data modeling, Capacitance

Proceedings Article | 2 June 2003
Proc. SPIE. 5038, Metrology, Inspection, and Process Control for Microlithography XVII
KEYWORDS: Semiconducting wafers, Line edge roughness, Atomic force microscopy, Scanning electron microscopy, Voltage controlled current source, Optical resolution, Manufacturing, Reticles, Edge roughness, Microelectronics

Proceedings Article | 2 June 2003
Proc. SPIE. 5038, Metrology, Inspection, and Process Control for Microlithography XVII
KEYWORDS: Scanning electron microscopy, Semiconducting wafers, Critical dimension metrology, Metrology, Optical testing, Electron beams, Manufacturing, Tolerancing, Calibration, Process control

Proceedings Article | 16 July 2002
Proc. SPIE. 4689, Metrology, Inspection, and Process Control for Microlithography XVI
KEYWORDS: Critical dimension metrology, Smoothing, Scanning electron microscopy, Etching, Signal to noise ratio, Semiconducting wafers, Standards development, Transistors, Finite element methods, Process control

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