Jason Osborne
Principal Engineer at Bruker Nano
SPIE Involvement:
Author
Publications (13)

Proceedings Article | 2 April 2020 Presentation + Paper
Proc. SPIE. 11325, Metrology, Inspection, and Process Control for Microlithography XXXIV
KEYWORDS: X-ray optics, Metrology, Visualization, Gallium arsenide, Atomic force microscopy, Scanning electron microscopy, Transmission electron microscopy, 3D metrology, Measurement devices, Semiconducting wafers

Proceedings Article | 20 March 2020 Presentation + Paper
Proc. SPIE. 11325, Metrology, Inspection, and Process Control for Microlithography XXXIV
KEYWORDS: Metrology, Calibration, Atomic force microscopy, Scanning electron microscopy, Scatterometry, Extreme ultraviolet, Critical dimension metrology, Line edge roughness, Semiconducting wafers, Stochastic processes

Proceedings Article | 16 April 2019 Presentation + Paper
Proc. SPIE. 10959, Metrology, Inspection, and Process Control for Microlithography XXXIII
KEYWORDS: Metrology, Sensors, Calibration, Electrons, 3D modeling, Atomic force microscopy, Scanning electron microscopy, 3D metrology, Optical proximity correction, Signal detection

Proceedings Article | 18 March 2016 Paper
Proc. SPIE. 9778, Metrology, Inspection, and Process Control for Microlithography XXX
KEYWORDS: Metrology, Diffractive optical elements, Metals, Atomic force microscopy, Transmission electron microscopy, Scatterometry, 3D metrology, Semiconducting wafers, Pulmonary function tests, Overlay metrology

Proceedings Article | 10 April 2015 Paper
Proc. SPIE. 9424, Metrology, Inspection, and Process Control for Microlithography XXIX
KEYWORDS: Electron beams, Metrology, Data modeling, Atomic force microscopy, Optical testing, Scanning electron microscopy, Data acquisition, Optical simulations, Scanning probe microscopy, Semiconducting wafers

Showing 5 of 13 publications
SIGN IN TO:
  • View contact details

UPDATE YOUR PROFILE
Is this your profile? Update it now.
Don’t have a profile and want one?

Advertisement
Advertisement
Back to Top