Jason Aaron Plumhoff
Business Unit Manager of Photomask at Oerlikon USA Inc
SPIE Involvement:
Publications (20)

Proceedings Article | 19 May 2008 Paper
Proceedings Volume 7028, 702807 (2008) https://doi.org/10.1117/12.793016
KEYWORDS: Etching, Quartz, Chromium, Phase shifts, Reflectivity, Metrology, Scatterometry, Atomic force microscopy, Standards development, Time metrology

Proceedings Article | 20 October 2006 Paper
Proceedings Volume 6349, 63490A (2006) https://doi.org/10.1117/12.686390
KEYWORDS: Etching, Photomasks, Chromium, Binary data, Critical dimension metrology, Plasma, Control systems, Ions, Lithography

Proceedings Article | 20 May 2006 Paper
Proceedings Volume 6283, 62831U (2006) https://doi.org/10.1117/12.681757
KEYWORDS: Etching, Chromium, Genetic algorithms, Signal processing, Plasma, Photomasks, Signal to noise ratio, Plasma etching, Sensors, Reflectivity

Proceedings Article | 28 June 2005 Paper
Proceedings Volume 5853, (2005) https://doi.org/10.1117/12.617095
KEYWORDS: Etching, Quartz, Photomasks, Phase shifts, Chromium, Chemistry, Dry etching, Plasma, Scanning electron microscopy, Photoresist processing

Proceedings Article | 6 December 2004 Paper
Proceedings Volume 5567, (2004) https://doi.org/10.1117/12.571468
KEYWORDS: Etching, Photomasks, Quartz, Scanning electron microscopy, Reactive ion etching, Phase shifts, Dry etching, Lithography, Manufacturing, Surface roughness

Showing 5 of 20 publications
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