Dr. Jason J. Shieh
at ASML Taiwan Ltd
SPIE Involvement:
Author
Publications (10)

PROCEEDINGS ARTICLE | March 30, 2017
Proc. SPIE. 10147, Optical Microlithography XXX
KEYWORDS: Lithography, Light sources, Eye, Metrology, Optical lithography, Image processing, Control systems, Electroluminescence, Process control, Source mask optimization, Optical proximity correction, Critical dimension metrology, Overlay metrology

PROCEEDINGS ARTICLE | April 18, 2013
Proc. SPIE. 8681, Metrology, Inspection, and Process Control for Microlithography XXVII
KEYWORDS: Lithography, Data modeling, Calibration, Scatterometry, Signal processing, Process control, Photomasks, Optical proximity correction, Systems modeling, Process modeling

PROCEEDINGS ARTICLE | April 5, 2012
Proc. SPIE. 8324, Metrology, Inspection, and Process Control for Microlithography XXVI
KEYWORDS: Metrology, Data modeling, Error analysis, Time metrology, Process control, Semiconducting wafers, Yield improvement, Overlay metrology, Process modeling, Instrument modeling

PROCEEDINGS ARTICLE | April 5, 2012
Proc. SPIE. 8324, Metrology, Inspection, and Process Control for Microlithography XXVI
KEYWORDS: Lithography, Diffraction, Metrology, Data modeling, Calibration, Image processing, Scatterometry, Scatter measurement, Process modeling, Diffraction gratings

PROCEEDINGS ARTICLE | December 14, 2009
Proc. SPIE. 7520, Lithography Asia 2009
KEYWORDS: Lithography, Metrology, Scanners, Scanning electron microscopy, Scatterometry, Time metrology, Optical proximity correction, Critical dimension metrology, Semiconducting wafers, Systems modeling

PROCEEDINGS ARTICLE | December 12, 2009
Proc. SPIE. 7520, Lithography Asia 2009
KEYWORDS: Diffraction, Reticles, Metrology, Scanners, Scanning electron microscopy, Scatterometry, Finite element methods, Critical dimension metrology, Semiconducting wafers, Scatter measurement

Showing 5 of 10 publications
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