Dr. Jason J. Shieh
at ASML Taiwan Ltd
SPIE Involvement:
Author
Publications (10)

Proceedings Article | 30 March 2017 Presentation + Paper
Proc. SPIE. 10147, Optical Microlithography XXX
KEYWORDS: Lithography, Light sources, Eye, Metrology, Optical lithography, Image processing, Control systems, Electroluminescence, Process control, Source mask optimization, Optical proximity correction, Critical dimension metrology, Overlay metrology

Proceedings Article | 18 April 2013 Paper
Proc. SPIE. 8681, Metrology, Inspection, and Process Control for Microlithography XXVII
KEYWORDS: Lithography, Data modeling, Calibration, Scatterometry, Signal processing, Process control, Photomasks, Optical proximity correction, Systems modeling, Process modeling

Proceedings Article | 5 April 2012 Paper
Proc. SPIE. 8324, Metrology, Inspection, and Process Control for Microlithography XXVI
KEYWORDS: Metrology, Data modeling, Error analysis, Time metrology, Process control, Semiconducting wafers, Yield improvement, Overlay metrology, Process modeling, Instrument modeling

Proceedings Article | 5 April 2012 Paper
Proc. SPIE. 8324, Metrology, Inspection, and Process Control for Microlithography XXVI
KEYWORDS: Lithography, Diffraction, Metrology, Data modeling, Calibration, Image processing, Scatterometry, Scatter measurement, Process modeling, Diffraction gratings

Proceedings Article | 14 December 2009 Paper
Proc. SPIE. 7520, Lithography Asia 2009
KEYWORDS: Lithography, Metrology, Scanners, Scanning electron microscopy, Scatterometry, Time metrology, Optical proximity correction, Critical dimension metrology, Semiconducting wafers, Systems modeling

Showing 5 of 10 publications
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