Dr. Jason C. Yee Profile

Dr. Jason C. Yee

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Publications (5)

Proceedings Article | 15 July 2003 Paper

Complete monitoring strategy to quantify matching and performance for multiple CDSEM in advanced fab

Pey-Yuan Lee, Chi-Shen Lo, Yi-Hung Chen, Thomas Teng, Steven Fu, Mico Chu, Jason Yee

Proc. SPIE. 5041, Process and Materials Characterization and Diagnostics in IC Manufacturing

KEYWORDS: Carbon, Contamination, Data modeling, Metals, Materials processing, Manufacturing, Diagnostics, Critical dimension metrology, Material characterization, Plasma

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Proceedings Article | 24 July 2002 Paper

Stable E-beam metrology on ArF resist for advanced process control

Chih-Ming Ke, Anthony Yen, Jason Yee, Mico Chu, Steven Fu, Eros Huang, Debbie Yeh

Proc. SPIE. 4690, Advances in Resist Technology and Processing XIX

KEYWORDS: Metrology, Etching, Ions, Scanning electron microscopy, Photoresist materials, Process control, Plasma etching, Critical dimension metrology, Plasma treatment, Plasma

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Proceedings Article | 22 August 2001 Paper

Lihtography process optimization for 130-nm polygate mask and the impact of mask error factor

Stephen Hsu, Xuelong Shi, Robert Socha, J. Fung Chen, Jason Yee, Mohan Anath, Sunil Desai, Philip Imamura, Micheal Sherrill, Y. Tseng, H. Chang, J. Kao, Alex Tseng, WeiJyh Liu, Anseime Chen, Arthur Lin, Jan Kujten, Eric Jacobs, Arjan Verhappen

Proc. SPIE. 4344, Metrology, Inspection, and Process Control for Microlithography XV

KEYWORDS: Lithography, Reticles, Electroluminescence, Scanning electron microscopy, Photomasks, Optical proximity correction, Critical dimension metrology, Photoresist processing, Semiconducting wafers, Binary data

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Proceedings Article | 12 February 1997 Paper

Initial characterization results of a low-voltage CD SEM for reticle metrology

Rich Quattrini, Craig MacNaughton, Richard Elliott, Waiman Ng, Rohit Malhotra, Mohan Ananth, Jason Yee

Proc. SPIE. 3236, 17th Annual BACUS Symposium on Photomask Technology and Management

KEYWORDS: Reticles, Metrology, Quartz, Glasses, Silicon, Scanning electron microscopy, Photoresist materials, Photomasks, Critical dimension metrology, Semiconducting wafers

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Proceedings Article | 21 May 1996 Paper

Benchmarking multimode CD-SEM metrology to 180 nm

Kevin Monahan, Farid Askary, Richard Elliott, Randy Forcier, Rich Quattrini, Brian Sheumaker, Jason Yee, Herschel Marchman, Robert Bennett, Steven Carlson, Harry Sewell, Diane McCafferty, Javed Sumra, Jane Yan

Proc. SPIE. 2725, Metrology, Inspection, and Process Control for Microlithography X

KEYWORDS: Lithography, Reticles, Metrology, Deep ultraviolet, Calibration, Silicon, Atomic force microscopy, Scanning electron microscopy, Critical dimension metrology, Semiconducting wafers

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