Dr. Jason C. Yee
SPIE Involvement:
Author
Publications (5)

Proceedings Article | 15 July 2003 Paper
Proc. SPIE. 5041, Process and Materials Characterization and Diagnostics in IC Manufacturing
KEYWORDS: Carbon, Contamination, Data modeling, Metals, Materials processing, Manufacturing, Diagnostics, Critical dimension metrology, Material characterization, Plasma

Proceedings Article | 24 July 2002 Paper
Proc. SPIE. 4690, Advances in Resist Technology and Processing XIX
KEYWORDS: Metrology, Etching, Ions, Scanning electron microscopy, Photoresist materials, Process control, Plasma etching, Critical dimension metrology, Plasma treatment, Plasma

Proceedings Article | 22 August 2001 Paper
Proc. SPIE. 4344, Metrology, Inspection, and Process Control for Microlithography XV
KEYWORDS: Lithography, Reticles, Electroluminescence, Scanning electron microscopy, Photomasks, Optical proximity correction, Critical dimension metrology, Photoresist processing, Semiconducting wafers, Binary data

Proceedings Article | 12 February 1997 Paper
Proc. SPIE. 3236, 17th Annual BACUS Symposium on Photomask Technology and Management
KEYWORDS: Reticles, Metrology, Quartz, Glasses, Silicon, Scanning electron microscopy, Photoresist materials, Photomasks, Critical dimension metrology, Semiconducting wafers

Proceedings Article | 21 May 1996 Paper
Proc. SPIE. 2725, Metrology, Inspection, and Process Control for Microlithography X
KEYWORDS: Lithography, Reticles, Metrology, Deep ultraviolet, Calibration, Silicon, Atomic force microscopy, Scanning electron microscopy, Critical dimension metrology, Semiconducting wafers

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