Dr. Jaw-Jung Shin
Section Manager at Taiwan Semiconductor Manufacturing Co Ltd
SPIE Involvement:
Author
Publications (17)

Proceedings Article | 19 March 2015
Proc. SPIE. 9423, Alternative Lithographic Technologies VII
KEYWORDS: Electron beam lithography, Point spread functions, Backscatter, Scattering, Laser scattering, Feature extraction, Photomasks, Critical dimension metrology, Optimization (mathematics), Systems modeling

Proceedings Article | 28 March 2014
Proc. SPIE. 9049, Alternative Lithographic Technologies VI
KEYWORDS: Lithography, Electron beam lithography, Mirrors, Data compression, Switching, Electrodes, Reflectivity, Printing, Error control coding, Semiconducting wafers

Proceedings Article | 28 March 2014
Proc. SPIE. 9049, Alternative Lithographic Technologies VI
KEYWORDS: Microelectromechanical systems, Electron beam lithography, Electron beams, Electrodes, Dielectrics, Coating, Reflectivity, Lens design, Atomic layer deposition, Structural design

Proceedings Article | 26 March 2013
Proc. SPIE. 8680, Alternative Lithographic Technologies V
KEYWORDS: Silica, Backscatter, Scattering, Diffusion, Laser scattering, Electroluminescence, Monte Carlo methods, Quantization, Raster graphics, Modulation transfer functions

Proceedings Article | 4 April 2011
Proc. SPIE. 7970, Alternative Lithographic Technologies III
KEYWORDS: Optical fibers, Electron beam lithography, Data transmission, Maskless lithography, Raster graphics, Mask making, Critical dimension metrology, Electron beam direct write lithography, Semiconducting wafers, Tolerancing

Showing 5 of 17 publications
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