Dr. Jea-Hee Kim
Senior Manager at Dongbu HiTek Co Ltd
SPIE Involvement:
Publications (26)

Proceedings Article | 17 October 2008 Paper
Proceedings Volume 7122, 71220X (2008) https://doi.org/10.1117/12.801557
KEYWORDS: Photomasks, Lithography, Semiconducting wafers, Chromium, Optical proximity correction, Optical simulations, Resolution enhancement technologies, Binary data, Electrons, Optical lithography

Proceedings Article | 4 April 2008 Paper
Proceedings Volume 6923, 69233K (2008) https://doi.org/10.1117/12.772534
KEYWORDS: Critical dimension metrology, Photoresist processing, Head-mounted displays, Glasses, Cadmium, Lithography, Semiconducting wafers, Inspection, Resolution enhancement technologies, Lenses

Proceedings Article | 1 April 2008 Paper
Jae-Young Choi, Yeon-Ah Shim, Kyung-Hee Yun, Jong-Doo Kim, Jae-Hee Kim, Jae-Won Han
Proceedings Volume 6924, 69243L (2008) https://doi.org/10.1117/12.773092
KEYWORDS: Optical proximity correction, Data modeling, Critical dimension metrology, Semiconducting wafers, Photomasks, Error analysis, Lithography, Scattering, Glasses, Metals

Proceedings Article | 1 April 2008 Paper
Yeonah Shim, Jaeyoung Choi, Jeahee Kim, Bo Su, Ping Zhang, Keun-Young Kim
Proceedings Volume 6925, 692513 (2008) https://doi.org/10.1117/12.772409
KEYWORDS: Optical proximity correction, Design for manufacturing, Lithography, Semiconducting wafers, Data processing, Semiconductors, Failure analysis, Integrated circuit design, Design for manufacturability, Manufacturing

Proceedings Article | 1 April 2008 Paper
Hyesung Lee, Jaeyoung Choi, Jeahee Kim, Jaewon Han, Keun-Young Kim
Proceedings Volume 6924, 69244B (2008) https://doi.org/10.1117/12.773017
KEYWORDS: Nanoimprint lithography, Resolution enhancement technologies, Optical lithography, Photomasks, Critical dimension metrology, Diffractive optical elements, SRAF, Photoresist processing, Lithography, Optical proximity correction

Showing 5 of 26 publications
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