Dr. Jea-Hee Kim
Senior Manager at Dongbu Electronics Co Ltd
SPIE Involvement:
Author
Publications (26)

Proceedings Article | 17 October 2008
Proc. SPIE. 7122, Photomask Technology 2008
KEYWORDS: Lithography, Optical lithography, Electrons, Chromium, Photomasks, Optical simulations, Optical proximity correction, Semiconducting wafers, Binary data, Resolution enhancement technologies

Proceedings Article | 4 April 2008
Proc. SPIE. 6923, Advances in Resist Materials and Processing Technology XXV
KEYWORDS: Lithography, Cadmium, Lenses, Glasses, Inspection, Head-mounted displays, Critical dimension metrology, Photoresist processing, Semiconducting wafers, Resolution enhancement technologies

Proceedings Article | 1 April 2008
Proc. SPIE. 6925, Design for Manufacturability through Design-Process Integration II
KEYWORDS: Semiconductors, Lithography, Manufacturing, Data processing, Design for manufacturing, Optical proximity correction, Semiconducting wafers, Integrated circuit design, Failure analysis, Design for manufacturability

Proceedings Article | 1 April 2008
Proc. SPIE. 6924, Optical Microlithography XXI
KEYWORDS: Lithography, Optical lithography, Diffractive optical elements, Photomasks, Optical proximity correction, SRAF, Nanoimprint lithography, Critical dimension metrology, Photoresist processing, Resolution enhancement technologies

Proceedings Article | 1 April 2008
Proc. SPIE. 6924, Optical Microlithography XXI
KEYWORDS: Lithography, Data modeling, Scattering, Metals, Glasses, Error analysis, Photomasks, Optical proximity correction, Critical dimension metrology, Semiconducting wafers

Showing 5 of 26 publications
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