Prof. Jea-Young Jun
at SK Hynix Inc
SPIE Involvement:
Author
Publications (6)

PROCEEDINGS ARTICLE | October 17, 2014
Proc. SPIE. 9235, Photomask Technology 2014
KEYWORDS: Etching, Particles, Manufacturing, Inspection, Control systems, Scanning electron microscopy, Photomasks, Extreme ultraviolet, Plasma etching, Plasma

PROCEEDINGS ARTICLE | October 14, 2011
Proc. SPIE. 8166, Photomask Technology 2011
KEYWORDS: Etching, Air contamination, Image processing, Ions, Chromium, Oxygen, Transmission electron microscopy, Transmittance, Photomasks, Semiconducting wafers

PROCEEDINGS ARTICLE | September 29, 2010
Proc. SPIE. 7823, Photomask Technology 2010
KEYWORDS: Electron beam lithography, Calibration, Etching, Dry etching, Image processing, Reliability, Chromium, Scanning electron microscopy, Photomasks, Critical dimension metrology

PROCEEDINGS ARTICLE | October 30, 2007
Proc. SPIE. 6730, Photomask Technology 2007
KEYWORDS: Semiconductors, Electron beams, Etching, Dry etching, Reliability, Chromium, Scanning electron microscopy, Process control, Photomasks, Critical dimension metrology

PROCEEDINGS ARTICLE | November 5, 2005
Proc. SPIE. 5992, 25th Annual BACUS Symposium on Photomask Technology
KEYWORDS: Etching, Dry etching, Air contamination, Glasses, Ions, Heat treatments, Atomic force microscopy, Photomasks, Wet etching, Molybdenum

PROCEEDINGS ARTICLE | December 6, 2004
Proc. SPIE. 5567, 24th Annual BACUS Symposium on Photomask Technology
KEYWORDS: Electron beam lithography, Defect detection, Particles, Nd:YAG lasers, Inspection, Chromium, Process control, Photomasks, Critical dimension metrology, Defect inspection

Showing 5 of 6 publications
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