Jean-Christophe Le-Denmat
at STMicroelectronics
SPIE Involvement:
Publications (15)

Proceedings Article | 24 March 2016 Paper
P. Fanton, J. C. Le Denmat, C. Gardiola, A. Pelletier, F. Foussadier, C. Gardin, J. Planchot, A. Szucs, O. Ndiaye, N. Martin, L. Depre, F. Robert
Proceedings Volume 9778, 97781U (2016)
KEYWORDS: 3D modeling, Optical proximity correction, Metals, 3D metrology, Optical lithography, Evolutionary algorithms, Photomasks, Scanning electron microscopy, Critical dimension metrology, Image processing, Etching, Calibration, Artificial intelligence, Reliability

Proceedings Article | 18 March 2015 Paper
Jean-Christophe Le Denmat, Nelly Feldman, Olivia Riewer, Emek Yesilada, Michel Vallet, Christophe Suzor, Salvatore Talluto
Proceedings Volume 9427, 942705 (2015)
KEYWORDS: Manufacturing, Metals, Design for manufacturability, Semiconducting wafers, Optical proximity correction, Diagnostics, Photomasks, Wafer inspection, Statistical analysis, Optical lithography

Proceedings Article | 31 March 2014 Paper
Proceedings Volume 9052, 90520D (2014)
KEYWORDS: Semiconducting wafers, Data modeling, Optical proximity correction, Calibration, Optical lithography, Wafer-level optics, Scanning electron microscopy, Photomasks, Modulation, Lithography

Proceedings Article | 31 March 2014 Paper
Proceedings Volume 9052, 905223 (2014)
KEYWORDS: Semiconducting wafers, Global system for mobile communications, Optical lithography, Photomasks, Finite-difference time-domain method, Computer simulations, Silicon, Lithography, Wafer-level optics, Optical proximity correction

Proceedings Article | 1 October 2013 Paper
Proceedings Volume 8880, 88801J (2013)
KEYWORDS: Semiconducting wafers, Optical proximity correction, Data modeling, Silicon, Calibration, 3D modeling, Photomasks, Modulation, Scanning electron microscopy, Active optics

Showing 5 of 15 publications
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