Jean-Christophe Le-Denmat
at STMicroelectronics
SPIE Involvement:
Author
Publications (15)

Proceedings Article | 24 March 2016
Proc. SPIE. 9778, Metrology, Inspection, and Process Control for Microlithography XXX
KEYWORDS: 3D modeling, Optical proximity correction, Metals, 3D metrology, Optical lithography, Evolutionary algorithms, Photomasks, Scanning electron microscopy, Critical dimension metrology, Image processing, Etching, Calibration, Artificial intelligence, Reliability

Proceedings Article | 18 March 2015
Proc. SPIE. 9427, Design-Process-Technology Co-optimization for Manufacturability IX
KEYWORDS: Manufacturing, Metals, Design for manufacturability, Semiconducting wafers, Optical proximity correction, Diagnostics, Photomasks, Wafer inspection, Statistical analysis, Optical lithography

Proceedings Article | 31 March 2014
Proc. SPIE. 9052, Optical Microlithography XXVII
KEYWORDS: Semiconducting wafers, Global system for mobile communications, Optical lithography, Photomasks, Finite-difference time-domain method, Computer simulations, Silicon, Lithography, Wafer-level optics, Optical proximity correction

Proceedings Article | 31 March 2014
Proc. SPIE. 9052, Optical Microlithography XXVII
KEYWORDS: Semiconducting wafers, Data modeling, Optical proximity correction, Calibration, Optical lithography, Wafer-level optics, Scanning electron microscopy, Photomasks, Modulation, Lithography

Proceedings Article | 1 October 2013
Proc. SPIE. 8880, Photomask Technology 2013
KEYWORDS: Semiconducting wafers, Optical proximity correction, Data modeling, Silicon, Calibration, 3D modeling, Photomasks, Modulation, Scanning electron microscopy, Active optics

Showing 5 of 15 publications
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