Jean-Christophe Michel
at STMicroelectronics
SPIE Involvement:
Author
Publications (6)

SPIE Journal Paper | April 10, 2015
JM3 Vol. 14 Issue 02
KEYWORDS: Semiconducting wafers, Optical lithography, Critical dimension metrology, Process control, Photomasks, Etching, Logic, Metrology, Lithography, Optical proximity correction

PROCEEDINGS ARTICLE | March 31, 2014
Proc. SPIE. 9052, Optical Microlithography XXVII
KEYWORDS: Wafer-level optics, Lithography, Optical lithography, Data modeling, Modulation, Calibration, Scanning electron microscopy, Photomasks, Optical proximity correction, Semiconducting wafers

PROCEEDINGS ARTICLE | March 31, 2014
Proc. SPIE. 9052, Optical Microlithography XXVII
KEYWORDS: Wafer-level optics, Lithography, Finite-difference time-domain method, Optical lithography, Silicon, Computer simulations, Photomasks, Optical proximity correction, Semiconducting wafers, Global system for mobile communications

PROCEEDINGS ARTICLE | October 1, 2013
Proc. SPIE. 8880, Photomask Technology 2013
KEYWORDS: Data modeling, Modulation, Calibration, Silicon, 3D modeling, Scanning electron microscopy, Photomasks, Optical proximity correction, Semiconducting wafers, Active optics

PROCEEDINGS ARTICLE | April 12, 2013
Proc. SPIE. 8683, Optical Microlithography XXVI
KEYWORDS: Lithography, Optical lithography, Calibration, Silicon, Inspection, Scanning electron microscopy, Photomasks, Optical proximity correction, Semiconducting wafers, Defect inspection

PROCEEDINGS ARTICLE | April 12, 2013
Proc. SPIE. 8683, Optical Microlithography XXVI
KEYWORDS: Oxides, Optical lithography, Data modeling, Calibration, Silicon, 3D modeling, Scanning electron microscopy, Photomasks, Semiconducting wafers, Process modeling

Showing 5 of 6 publications
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