Jean-Christophe Michel
at STMicroelectronics
SPIE Involvement:
Author
Publications (6)

SPIE Journal Paper | 10 April 2015
JM3 Vol. 14 Issue 02
KEYWORDS: Semiconducting wafers, Optical lithography, Critical dimension metrology, Process control, Photomasks, Etching, Logic, Metrology, Lithography, Optical proximity correction

Proceedings Article | 31 March 2014
Proc. SPIE. 9052, Optical Microlithography XXVII
KEYWORDS: Semiconducting wafers, Data modeling, Optical proximity correction, Calibration, Optical lithography, Wafer-level optics, Scanning electron microscopy, Photomasks, Modulation, Lithography

Proceedings Article | 31 March 2014
Proc. SPIE. 9052, Optical Microlithography XXVII
KEYWORDS: Semiconducting wafers, Global system for mobile communications, Optical lithography, Photomasks, Finite-difference time-domain method, Computer simulations, Silicon, Lithography, Wafer-level optics, Optical proximity correction

Proceedings Article | 1 October 2013
Proc. SPIE. 8880, Photomask Technology 2013
KEYWORDS: Semiconducting wafers, Optical proximity correction, Data modeling, Silicon, Calibration, 3D modeling, Photomasks, Modulation, Scanning electron microscopy, Active optics

Proceedings Article | 12 April 2013
Proc. SPIE. 8683, Optical Microlithography XXVI
KEYWORDS: Photomasks, Semiconducting wafers, Optical proximity correction, Silicon, Optical lithography, Calibration, Lithography, Defect inspection, Inspection, Scanning electron microscopy

Showing 5 of 6 publications
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