Jean-Damien Chapon
at STMicroelectronics
SPIE Involvement:
Author
Publications (16)

Proceedings Article | 13 March 2018
Proc. SPIE. 10585, Metrology, Inspection, and Process Control for Microlithography XXXII
KEYWORDS: Reticles, Optical lithography, Data modeling, Scanners, Reliability, Process control, Optical alignment, Overlay metrology

SPIE Journal Paper | 10 April 2015
JM3 Vol. 14 Issue 02
KEYWORDS: Semiconducting wafers, Optical lithography, Critical dimension metrology, Process control, Photomasks, Etching, Logic, Metrology, Lithography, Optical proximity correction

Proceedings Article | 2 April 2010
Proc. SPIE. 7638, Metrology, Inspection, and Process Control for Microlithography XXIV
KEYWORDS: Metrology, Logic, Optical lithography, Etching, Scanners, Process control, Photomasks, Critical dimension metrology, Semiconducting wafers, Airborne remote sensing

Proceedings Article | 24 March 2009
Proc. SPIE. 7272, Metrology, Inspection, and Process Control for Microlithography XXIII
KEYWORDS: Reticles, Metrology, Logic, Optical lithography, Scanners, Scatterometry, Process control, Photomasks, Critical dimension metrology, Semiconducting wafers

Proceedings Article | 22 March 2008
Proc. SPIE. 6922, Metrology, Inspection, and Process Control for Microlithography XXII
KEYWORDS: Reticles, Optical lithography, Etching, Scanners, Scatterometry, Process control, Photomasks, Immersion lithography, Critical dimension metrology, Semiconducting wafers

Showing 5 of 16 publications
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