Dr. Jean Gabriel Simiz
RET / OPC Engineer at STMicroelectronics
SPIE Involvement:
Author
Publications (5)

PROCEEDINGS ARTICLE | March 28, 2017
Proc. SPIE. 10145, Metrology, Inspection, and Process Control for Microlithography XXXI
KEYWORDS: Lithography, Electron beam lithography, Metrology, Optical lithography, Scanners, Inspection, Scanning electron microscopy, Finite element methods, Computational lithography, Semiconducting wafers

PROCEEDINGS ARTICLE | March 16, 2016
Proc. SPIE. 9781, Design-Process-Technology Co-optimization for Manufacturability X
KEYWORDS: Reticles, Optical lithography, Data modeling, Visualization, Sensors, Scanners, Manufacturing, Image resolution, Time metrology, Photomasks, Semiconducting wafers, Product engineering, Performance modeling, Chemical mechanical planarization, Design for manufacturability

PROCEEDINGS ARTICLE | March 8, 2016
Proc. SPIE. 9778, Metrology, Inspection, and Process Control for Microlithography XXX
KEYWORDS: Lithography, Metrology, Optical lithography, Defect detection, Etching, Metals, Image processing, Scanners, 3D modeling, Scanning electron microscopy, Data processing, Process control, Finite element methods, Photomasks, Computational lithography, Semiconducting wafers

PROCEEDINGS ARTICLE | September 4, 2015
Proc. SPIE. 9661, 31st European Mask and Lithography Conference
KEYWORDS: Logic, Optical lithography, Sensors, Scanners, Printing, Photomasks, Semiconducting wafers, Product engineering, Electroluminescent displays, Polonium

PROCEEDINGS ARTICLE | March 19, 2015
Proc. SPIE. 9424, Metrology, Inspection, and Process Control for Microlithography XXIX
KEYWORDS: Wafer-level optics, Data modeling, Sensors, Scanners, Silicon, Finite element methods, Photomasks, Convolution, Semiconducting wafers, Chemical mechanical planarization

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