Mr. Jean-Paul E. Sier
Applications Engineer at KLA-Tencor Corp
SPIE Involvement:
Author
Publications (8)

PROCEEDINGS ARTICLE | October 14, 2011
Proc. SPIE. 8166, Photomask Technology 2011
KEYWORDS: Databases, Manufacturing, Inspection, Data processing, Explosives, Data conversion, Neodymium, Photomask technology, Polonium, Current controlled current source

PROCEEDINGS ARTICLE | May 2, 2008
Proc. SPIE. 6792, 24th European Mask and Lithography Conference
KEYWORDS: Reticles, Logic, Defect detection, Data modeling, Databases, Inspection, 3D modeling, Image transmission, Optical proximity correction, SRAF

PROCEEDINGS ARTICLE | November 16, 2007
Proc. SPIE. 6730, Photomask Technology 2007
KEYWORDS: Contamination, Defect detection, Modulation, Databases, Quartz, Inspection, Photomasks, Environmental sensing, Stereolithography, Defect inspection

PROCEEDINGS ARTICLE | October 25, 2007
Proc. SPIE. 6730, Photomask Technology 2007
KEYWORDS: Reticles, Logic, Defect detection, Data modeling, Databases, Inspection, 3D modeling, Image transmission, Optical proximity correction, SRAF

PROCEEDINGS ARTICLE | May 15, 2007
Proc. SPIE. 6607, Photomask and Next-Generation Lithography Mask Technology XIV
KEYWORDS: Reticles, Contamination, Stars, Defect detection, Detection and tracking algorithms, Optical properties, Inspection, Photomasks, Dysprosium, Defect inspection

PROCEEDINGS ARTICLE | May 14, 2007
Proc. SPIE. 6607, Photomask and Next-Generation Lithography Mask Technology XIV
KEYWORDS: Reticles, Defect detection, Data modeling, Sensors, Databases, Image processing, Manufacturing, Inspection, Image transmission, SRAF

Showing 5 of 8 publications
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