Mr. Jean-Paul E. Sier Profile

Jean-Paul E. Sier

Applications Engineer at KLA Corp

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Author

Publications (8)

Proceedings Article | 14 October 2011 Paper

High speed mask inspection data prep flow based on pipelining

Dan Hung, Domingo Morales, Juan Pablo Canepa, Stephen Kim, Po Liu, Jean-Paul Sier, Patrick LoPresti

Proceedings Volume 8166, 81660R (2011) https://doi.org/10.1117/12.896964

KEYWORDS: Inspection, Data conversion, Data processing, Databases, Manufacturing, Explosives, Neodymium, Polonium, Photomask technology, Current controlled current source

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Proceedings Article | 2 May 2008 Paper

Inspection results of advanced (sub-50nm design rule) reticles using the TeraScanHR

Jean-Paul Sier, William Broadbent, Paul Yu

Proceedings Volume 6792, 67920I (2008) https://doi.org/10.1117/12.798601

KEYWORDS: Inspection, Reticles, Databases, Defect detection, SRAF, 3D modeling, Data modeling, Image transmission, Logic, Optical proximity correction

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Proceedings Article | 16 November 2007 Paper

Sensitivity comparison of fast integrated die-to-die T+R pattern inspection, standard database inspection, and STARlight2 contamination mode for application in mask production

Heiko Schmalfuss, Thomas Schulmeyer, Jan Heumann, Michael Lang, Jean-Paul Sier

Proceedings Volume 6730, 673025 (2007) https://doi.org/10.1117/12.747164

KEYWORDS: Inspection, Contamination, Photomasks, Defect detection, Databases, Defect inspection, Stereolithography, Modulation, Environmental sensing, Quartz

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Proceedings Article | 25 October 2007 Paper

Inspection results for 32nm logic and sub-50nm half-pitch memory reticles using the TeraScanHR

Jean-Paul Sier, William Broadbent, Farzin Mirzaagha, Paul Yu

Proceedings Volume 6730, 67302A (2007) https://doi.org/10.1117/12.747295

KEYWORDS: Inspection, Reticles, Databases, Defect detection, SRAF, 3D modeling, Data modeling, Logic, Image transmission, Optical proximity correction

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Proceedings Article | 15 May 2007 Paper

Enhancing productivity and sensitivity in mask production via a fast integrated T+R pattern inspection and STARlight-2 contamination inspection on critical layers

Jean-Paul Sier, Eric Haodong Lu, Kaustuve Bhattacharyya, Swapnajit Chakravarty, Michael Lang, Heiko Schmalfuss, Jan Heumann, Thomas Schulmeyer

Proceedings Volume 6607, 66072C (2007) https://doi.org/10.1117/12.728995

KEYWORDS: Inspection, Defect detection, Contamination, Reticles, Photomasks, Defect inspection, Detection and tracking algorithms, Stars, Dysprosium, Optical properties

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Proceedings Article | 14 May 2007 Paper

Field results from a new die-to-database reticle inspection platform

William Broadbent, Ichiro Yokoyama, Paul Yu, Kazunori Seki, Ryohei Nomura, Heiko Schmalfuss, Jan Heumann, Jean-Paul Sier

Proceedings Volume 6607, 660714 (2007) https://doi.org/10.1117/12.728953

KEYWORDS: Reticles, Inspection, Image transmission, Image processing, Databases, SRAF, Defect detection, Sensors, Data modeling, Manufacturing

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Proceedings Article | 9 November 2005 Paper

Optimized inspection of advanced reticles on the TeraScan reticle inspection tool

Aditya Dayal, J.-P. Sier, Weston Sousa, Steven Labovitz

Proceedings Volume 5992, 599245 (2005) https://doi.org/10.1117/12.634078

KEYWORDS: Inspection, Reticles, Contamination, Photomasks, Image transmission, Defect detection, Databases, Digital breast tomosynthesis, Resolution enhancement technologies, Opacity

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Proceedings Article | 6 December 2004 Paper

Double dipole lithography for 65-nm node and beyond: defect sensitivity characterization and reticle inspection

Stephen Hsu, Tsann-bin Chu, Douglas Van Den Broeke, J. Fung Chen, Michael Hsu, Noel Corcoran, William Volk, Wayne Ruch, Jean-Paul Sier, Carl Hess, Benjamin Lin, Chun-Chi Yu, George Huang

Proceedings Volume 5567, (2004) https://doi.org/10.1117/12.569367

KEYWORDS: Inspection, Reticles, Photomasks, Lithography, Resolution enhancement technologies, Defect inspection, Semiconducting wafers, Model-based design, Optical proximity correction, Scattering

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Showing 5 of 8 publications

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