Jean De-Caunes
at STMicroelectronics
SPIE Involvement:
Author
Publications (10)

Proceedings Article | 26 March 2019
Proc. SPIE. 10959, Metrology, Inspection, and Process Control for Microlithography XXXIII
KEYWORDS: Lithography, Reticles, Metrology, Logic, Scanners, Process control, Photomasks, Semiconducting wafers, Overlay metrology, Process engineering

Proceedings Article | 13 March 2018
Proc. SPIE. 10585, Metrology, Inspection, and Process Control for Microlithography XXXII
KEYWORDS: Reticles, Optical lithography, Data modeling, Scanners, Reliability, Process control, Optical alignment, Overlay metrology

Proceedings Article | 4 September 2015
Proc. SPIE. 9661, 31st European Mask and Lithography Conference
KEYWORDS: Wafer-level optics, Metrology, Logic, Optical properties, Sensors, Metals, Scanners, Data processing, Photomasks, Semiconducting wafers

SPIE Journal Paper | 10 April 2015
JM3 Vol. 14 Issue 02
KEYWORDS: Semiconducting wafers, Optical lithography, Critical dimension metrology, Process control, Photomasks, Etching, Logic, Metrology, Lithography, Optical proximity correction

Proceedings Article | 17 October 2014
Proc. SPIE. 9231, 30th European Mask and Lithography Conference
KEYWORDS: Metrology, Logic, Data modeling, Databases, Etching, Scanners, Control systems, Process control, Photomasks, Semiconducting wafers

Showing 5 of 10 publications
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