Dr. Jeanette M. Roberts
Staff Engineer at Intel Corp
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Publications (30)

Proceedings Article | 31 March 2010
Proc. SPIE. 7639, Advances in Resist Materials and Processing Technology XXVII
KEYWORDS: Lithography, Diffraction, MATLAB, Optical lithography, Image processing, Optical engineering, Photoresist processing, Semiconducting wafers, Systems modeling, Floods

Proceedings Article | 26 March 2010
Proc. SPIE. 7639, Advances in Resist Materials and Processing Technology XXVII
KEYWORDS: Lithography, Optical lithography, Polymers, Scanners, Photons, Photoresist materials, Photomasks, Semiconducting wafers, Floods, 193nm lithography

Proceedings Article | 1 April 2009
Proc. SPIE. 7273, Advances in Resist Materials and Processing Technology XXVI
KEYWORDS: Lithography, Polymers, Diffusion, Surface roughness, Atomic force microscopy, Profiling, Line width roughness, Line edge roughness, Photoresist processing, Polymer thin films

Proceedings Article | 1 April 2009
Proc. SPIE. 7273, Advances in Resist Materials and Processing Technology XXVI
KEYWORDS: Lithography, Mirrors, Titanium dioxide, Polymers, Silicon, Reflectivity, Extreme ultraviolet, Absorbance, Extreme ultraviolet lithography, Semiconducting wafers

Proceedings Article | 15 April 2008
Proc. SPIE. 6923, Advances in Resist Materials and Processing Technology XXV
KEYWORDS: Deep ultraviolet, Polymers, Matrices, Molecules, Photoresist materials, Ionization, Picosecond phenomena, Photolysis, Polymer thin films, Absorption

Proceedings Article | 26 March 2008
Proc. SPIE. 6923, Advances in Resist Materials and Processing Technology XXV
KEYWORDS: Lithography, Statistical analysis, Polymers, Molecules, Electrons, Quantum efficiency, Extreme ultraviolet, Line width roughness, Absorbance, Extreme ultraviolet lithography

Showing 5 of 30 publications
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