Dr. Jedsada Manyam
at Univ of Birmingham
SPIE Involvement:
Author
Publications (6)

Proceedings Article | 19 March 2012
Proc. SPIE. 8325, Advances in Resist Materials and Processing Technology XXIX
KEYWORDS: Lithography, Magnesium, Optical lithography, Silica, Glasses, Nitrogen, Solids, Fullerenes, Chromatography, Chemically amplified resists

Proceedings Article | 17 March 2012
Proc. SPIE. 8328, Advanced Etch Technology for Nanopatterning
KEYWORDS: Carbon, Etching, Silicon, Coating, Oxygen, Photoresist materials, Silicon carbide, Semiconducting wafers, Fullerenes, System on a chip

Proceedings Article | 16 April 2011
Proc. SPIE. 7972, Advances in Resist Materials and Processing Technology XXVIII
KEYWORDS: Lithography, Electron beam lithography, Etching, Silicon, Gases, Oxygen, Plasma etching, Photoresist processing, Fullerenes, Plasma

Proceedings Article | 30 March 2010
Proc. SPIE. 7639, Advances in Resist Materials and Processing Technology XXVII
KEYWORDS: Lithography, Electron beam lithography, Electron beams, Etching, Scanning electron microscopy, Line width roughness, Epoxies, Photoresist processing, Fullerenes, Chemically amplified resists

Proceedings Article | 1 April 2009
Proc. SPIE. 7273, Advances in Resist Materials and Processing Technology XXVI
KEYWORDS: Lithography, Etching, Image processing, Diffusion, Humidity, Line width roughness, Epoxies, Photoresist processing, Fullerenes, Chemically amplified resists

Proceedings Article | 15 April 2008
Proc. SPIE. 6923, Advances in Resist Materials and Processing Technology XXV
KEYWORDS: Carbon, Lithography, Electron beam lithography, Electron beams, Etching, Polymers, Scanning electron microscopy, Line width roughness, Photoresist processing, Fullerenes

Showing 5 of 6 publications
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