Jee-Hye You
at Hanyang Univ
SPIE Involvement:
Author
Publications (8)

PROCEEDINGS ARTICLE | March 23, 2010
Proc. SPIE. 7636, Extreme Ultraviolet (EUV) Lithography
KEYWORDS: Carbon, Optical lithography, Contamination, Image processing, Reflectivity, Surface roughness, Photomasks, Extreme ultraviolet, Extreme ultraviolet lithography, Ruthenium

PROCEEDINGS ARTICLE | March 4, 2010
Proc. SPIE. 7640, Optical Microlithography XXIII
KEYWORDS: Prisms, Optical lithography, Air contamination, Laser energy, Pellicles, Transmittance, Photomasks, Critical dimension metrology, Semiconducting wafers, Binary data

PROCEEDINGS ARTICLE | December 14, 2009
Proc. SPIE. 7520, Lithography Asia 2009
KEYWORDS: Lithography, Refractive index, Lithographic illumination, Photomasks, Extreme ultraviolet, Absorbance, Extreme ultraviolet lithography, Double patterning technology, Immersion lithography, Liquids

PROCEEDINGS ARTICLE | April 1, 2009
Proc. SPIE. 7273, Advances in Resist Materials and Processing Technology XXVI
KEYWORDS: Lithography, Electron beam lithography, Optical lithography, Cadmium, Glasses, Scanning electron microscopy, Optical proximity correction, Critical dimension metrology, Applied physics, Photoresist processing

PROCEEDINGS ARTICLE | March 18, 2009
Proc. SPIE. 7271, Alternative Lithographic Technologies
KEYWORDS: Lithography, Optical lithography, Lithographic illumination, Coherence (optics), Reflectivity, Photomasks, Extreme ultraviolet, Extreme ultraviolet lithography, Critical dimension metrology, Resolution enhancement technologies

PROCEEDINGS ARTICLE | December 4, 2008
Proc. SPIE. 7140, Lithography Asia 2008
KEYWORDS: Lithography, Optical lithography, Etching, Glasses, Photomasks, Extreme ultraviolet, Double patterning technology, Immersion lithography, Applied physics, Photoresist processing

Showing 5 of 8 publications
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