Dr. Jeff Chen
Customer Technology Manager at Applied Materials Inc
SPIE Involvement:
Author
Publications (7)

Proceedings Article | 23 October 2015
Proc. SPIE. 9635, Photomask Technology 2015
KEYWORDS: Etching, Photomasks, Opacity, Chromium, Critical dimension metrology, Process control, Phase shifts, Photoresist processing, Line edge roughness, Phase modulation

Proceedings Article | 14 October 2011
Proc. SPIE. 8166, Photomask Technology 2011
KEYWORDS: Etching, Photomasks, Extreme ultraviolet, Ruthenium, Line edge roughness, Multilayers, Binary data, Manufacturing, Extreme ultraviolet lithography, Tantalum

Proceedings Article | 11 May 2009
Proc. SPIE. 7379, Photomask and Next-Generation Lithography Mask Technology XVI
KEYWORDS: Etching, Chromium, Photomasks, Dry etching, Photoresist processing, Algorithm development, Plasma, Refractive index, Quartz, Photoresist materials

Proceedings Article | 11 May 2009
Proc. SPIE. 7379, Photomask and Next-Generation Lithography Mask Technology XVI
KEYWORDS: Plasma, Etching, Oxygen, Chromium, Chlorine, Atmospheric plasma, Spectroscopy, Photomasks, Phase modulation, Contamination

Proceedings Article | 19 May 2008
Proc. SPIE. 7028, Photomask and Next-Generation Lithography Mask Technology XV
KEYWORDS: Etching, Chromium, Chemistry, Plasma, Quartz, Photomasks, Photoresist materials, Particles, Critical dimension metrology, Plasma etching

Showing 5 of 7 publications
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