Dr. Jeff Chen
Customer Technology Manager at Applied Materials Inc
SPIE Involvement:
Author
Publications (7)

Proceedings Article | 23 October 2015
Proc. SPIE. 9635, Photomask Technology 2015
KEYWORDS: Phase modulation, Opacity, Etching, Chromium, Process control, Photomasks, Critical dimension metrology, Line edge roughness, Photoresist processing, Phase shifts

Proceedings Article | 14 October 2011
Proc. SPIE. 8166, Photomask Technology 2011
KEYWORDS: Multilayers, Etching, Manufacturing, Photomasks, Extreme ultraviolet, Extreme ultraviolet lithography, Line edge roughness, Tantalum, Binary data, Ruthenium

Proceedings Article | 11 May 2009
Proc. SPIE. 7379, Photomask and Next-Generation Lithography Mask Technology XVI
KEYWORDS: Refractive index, Etching, Quartz, Dry etching, Chromium, Photoresist materials, Photomasks, Algorithm development, Photoresist processing, Plasma

Proceedings Article | 11 May 2009
Proc. SPIE. 7379, Photomask and Next-Generation Lithography Mask Technology XVI
KEYWORDS: Contamination, Atmospheric plasma, Phase modulation, Etching, Spectroscopy, Chromium, Oxygen, Photomasks, Chlorine, Plasma

Proceedings Article | 19 May 2008
Proc. SPIE. 7028, Photomask and Next-Generation Lithography Mask Technology XV
KEYWORDS: Etching, Quartz, Particles, Chemistry, Chromium, Photoresist materials, Photomasks, Plasma etching, Critical dimension metrology, Plasma

Showing 5 of 7 publications
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