Jeff Farnsworth
Director of Mask Technology at Intel Corp
SPIE Involvement:
Author
Publications (22)

Proceedings Article | 7 March 2008 Paper
Proc. SPIE. 6924, Optical Microlithography XXI
KEYWORDS: Electron beam lithography, Optical lithography, Etching, Glasses, Image resolution, Chromium, 3D modeling, Photomasks, Semiconducting wafers, Defect inspection

SPIE Journal Paper | 1 January 2008
JM3 Vol. 7 Issue 01
KEYWORDS: Photomasks, Polarization, Diffraction, Optical proximity correction, Pellicles, Chromium, Fiber optic illuminators, Lithography, Optical lithography, Diffraction gratings

Proceedings Article | 14 May 2007 Paper
Proc. SPIE. 6607, Photomask and Next-Generation Lithography Mask Technology XIV
KEYWORDS: Electron beam lithography, Optical lithography, Scattering, Electrons, Diffusion, Chromium, Photomasks, Nanoimprint lithography, Critical dimension metrology, Laser phosphor displays

Proceedings Article | 27 March 2007 Paper
Proc. SPIE. 6520, Optical Microlithography XX
KEYWORDS: Diffraction, Apodization, Polarization, Imaging systems, Calcium, Pellicles, Photomasks, Immersion lithography, Optical proximity correction, Polarization control

Proceedings Article | 20 October 2006 Paper
Proc. SPIE. 6349, Photomask Technology 2006
KEYWORDS: Lithography, Reticles, Metrology, Scanning electron microscopy, Photomasks, Optical proximity correction, Critical dimension metrology, Semiconducting wafers, Tolerancing, Binary data

Showing 5 of 22 publications
Conference Committee Involvement (3)
Photomask and Next Generation Lithography Mask Technology XIV
17 April 2007 | Yokohama, Japan
Photomask and Next-Generation Lithography Mask Technology XIII
18 April 2006 | Yokohama, Japan
Photomask and Next-Generation Lithography Mask Technology XII
13 April 2005 | Yokohama, Japan
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