Jeff Farnsworth
Director of Mask Technology at Intel Corp
SPIE Involvement:
Conference Program Committee | Author
Publications (22)

Proceedings Article | 7 March 2008
Proc. SPIE. 6924, Optical Microlithography XXI
KEYWORDS: Photomasks, Optical lithography, Glasses, Image resolution, Chromium, Etching, 3D modeling, Electron beam lithography, Defect inspection, Semiconducting wafers

SPIE Journal Paper | 1 January 2008
JM3 Vol. 7 Issue 01
KEYWORDS: Photomasks, Polarization, Diffraction, Optical proximity correction, Pellicles, Chromium, Fiber optic illuminators, Lithography, Optical lithography, Diffraction gratings

Proceedings Article | 14 May 2007
Proc. SPIE. 6607, Photomask and Next-Generation Lithography Mask Technology XIV
KEYWORDS: Photomasks, Scattering, Electron beam lithography, Optical lithography, Critical dimension metrology, Nanoimprint lithography, Laser phosphor displays, Electrons, Chromium, Diffusion

Proceedings Article | 27 March 2007
Proc. SPIE. 6520, Optical Microlithography XX
KEYWORDS: Photomasks, Pellicles, Diffraction, Polarization, Apodization, Immersion lithography, Optical proximity correction, Calcium, Polarization control, Imaging systems

Proceedings Article | 20 October 2006
Proc. SPIE. 6349, Photomask Technology 2006
KEYWORDS: Photomasks, Semiconducting wafers, Critical dimension metrology, Optical proximity correction, Tolerancing, Binary data, Lithography, Scanning electron microscopy, Reticles, Metrology

Proceedings Article | 21 June 2006
Proc. SPIE. 6281, 22nd European Mask and Lithography Conference
KEYWORDS: Photomasks, Polarization, Optical proximity correction, Optical lithography, Lithography, Fiber optic illuminators, 3D image processing, Calibration, Phase shifts, Lithographic illumination

Showing 5 of 22 publications
Conference Committee Involvement (3)
Photomask and Next Generation Lithography Mask Technology XIV
17 April 2007 | Yokohama, Japan
Photomask and Next-Generation Lithography Mask Technology XIII
18 April 2006 | Yokohama, Japan
Photomask and Next-Generation Lithography Mask Technology XII
13 April 2005 | Yokohama, Japan
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