Dr. Jeff A. McMurran Profile

Dr. Jeff A. McMurran

Inspection Section Coordinator at Photronics Inc

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Author

Publications (8)

Proceedings Article | 20 October 2016 Paper

Mask manufacturing of advanced technology designs using multi-beam lithography (Part 1)

Michael Green, Young Ham, Brian Dillon, Bryan Kasprowicz, Ik Boum Hur, Joong Hee Park, Yohan Choi, Jeff McMurran, Henry Kamberian, Daniel Chalom, Jan Klikovits, Michal Jurkovic, Peter Hudek

Proceedings Volume 10032, 1003205 (2016) https://doi.org/10.1117/12.2247941

KEYWORDS: Photomasks, Manufacturing, Optical proximity correction, SRAF, Inspection, Metals, Optics manufacturing, Scanning electron microscopy, Logic, Lithography

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Proceedings Article | 5 October 2016 Paper

Wafer hot spot identification through advanced photomask characterization techniques

Yohan Choi, Michael Green, Jeff McMurran, Young Ham, Howard Lin, Andy Lan, Richer Yang, Mike Lung

Proceedings Volume 9985, 998521 (2016) https://doi.org/10.1117/12.2248678

KEYWORDS: Photomasks, Semiconducting wafers, Critical dimension metrology, 3D modeling, Optical proximity correction, Manufacturing, Metrology, Finite element methods, Mask making, Lithography

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Proceedings Article | 26 September 2016 Paper

Mask manufacturing of advanced technology designs using multi-beam lithography (part 2)

Michael Green, Young Ham, Brian Dillon, Bryan Kasprowicz, Ik Boum Hur, Joong Hee Park, Yohan Choi, Jeff McMurran, Henry Kamberian, Daniel Chalom, Jan Klikovits, Michal Jurkovic, Peter Hudek

Proceedings Volume 9985, 99850R (2016) https://doi.org/10.1117/12.2243407

KEYWORDS: Photomasks, SRAF, Optical proximity correction, Logic, Manufacturing, Metals, Inspection, Image processing, Information operations, Scanning electron microscopy

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Proceedings Article | 23 October 2015 Paper

In die mask overlay control for 14nm double-patterning lithography

William Chou, James Cheng, Alex Tseng, J. Wu, Chin Kuei Chang, Jeffrey Cheng, Adder Lee, Chain Ting Huang, N. Peng, Simon C. Hsu, Chun Chi Yu, Colbert Lu, Julia Yu, Peter Craig, Chuck Pollock, Young Ham, Jeff McMurran

Proceedings Volume 9635, 96351R (2015) https://doi.org/10.1117/12.2196794

KEYWORDS: Photomasks, Semiconducting wafers, Overlay metrology, Image registration, Double patterning technology, Lithography, Source mask optimization, Reticles, Pellicles, 193nm lithography

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Proceedings Article | 30 September 2009 Paper

Critical dimension uniformity using reticle inspection tool

Mark Wylie, Trent Hutchinson, Gang Pan, Thomas Vavul, John Miller, Aditya Dayal, Carl Hess, Mike Green, Shad Hedges, Dan Chalom, Maciej Rudzinski, Craig Wood, Jeff McMurran

Proceedings Volume 7488, 74881O (2009) https://doi.org/10.1117/12.830148

KEYWORDS: Photomasks, Reticles, Scanning electron microscopy, Critical dimension metrology, Inspection, Manufacturing, Etching, Error analysis, Semiconducting wafers, Binary data

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Proceedings Article | 27 May 2009 Paper

Nuisance event reduction using sensitivity control layers (SCL) for advanced photomask inspection

Shad Hedges, Chin Le, Mark Eickhoff, Mark Wylie, Tim Simmons, Venugopal Vellanki, Jeff McMurran

Proceedings Volume 7470, 74700U (2009) https://doi.org/10.1117/12.835192

KEYWORDS: Inspection, Photomasks, Databases, SRAF, Optical proximity correction, Semiconducting wafers, Reticles, Defect detection, Feature extraction, Opacity

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Proceedings Article | 11 May 2009 Paper

Haze growth on reticles: What's the RigHT thing to do?

Steven McDonald, Daniel Chalom, Michael Green, Jeffrey McMurran, Michael Garrett, David Dlouhy

Proceedings Volume 7379, 73790F (2009) https://doi.org/10.1117/12.824256

KEYWORDS: Reticles, Air contamination, Photomasks, Semiconducting wafers, Inspection, Wafer inspection, Semiconductors, Pellicles, Scanners, Manufacturing

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Proceedings Article | 17 October 2008 Paper

Novel mask inspection flow using Sensitivity Control Layers (SCL) on the TeraScanHR-587 platform

Shad Hedges, Chin Le, Mark Eickhoff, Mark Wylie, Tim Simmons, Venu Vellanki, Jeff McMurran

Proceedings Volume 7122, 71221G (2008) https://doi.org/10.1117/12.801480

KEYWORDS: Inspection, Databases, Photomasks, SRAF, Optical proximity correction, Semiconducting wafers, Reticles, Defect detection, Feature extraction, Opacity

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Showing 5 of 8 publications

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