Dr. Jeff A. McMurran
Inspection Section Coordinator at Photronics Inc
SPIE Involvement:
Author
Publications (8)

Proceedings Article | 20 October 2016
Proc. SPIE. 10032, 32nd European Mask and Lithography Conference
KEYWORDS: Lithography, Logic, Metals, Manufacturing, Inspection, Scanning electron microscopy, Photomasks, Optical proximity correction, SRAF, Optics manufacturing

Proceedings Article | 5 October 2016
Proc. SPIE. 9985, Photomask Technology 2016
KEYWORDS: Lithography, Metrology, Manufacturing, 3D modeling, Finite element methods, Photomasks, Optical proximity correction, Mask making, Critical dimension metrology, Semiconducting wafers

Proceedings Article | 26 September 2016
Proc. SPIE. 9985, Photomask Technology 2016
KEYWORDS: Logic, Metals, Image processing, Manufacturing, Inspection, Scanning electron microscopy, Photomasks, Optical proximity correction, SRAF, Information operations

Proceedings Article | 23 October 2015
Proc. SPIE. 9635, Photomask Technology 2015
KEYWORDS: Lithography, Reticles, Image registration, Pellicles, Photomasks, Double patterning technology, Source mask optimization, Semiconducting wafers, Overlay metrology, 193nm lithography

Proceedings Article | 30 September 2009
Proc. SPIE. 7488, Photomask Technology 2009
KEYWORDS: Reticles, Etching, Error analysis, Manufacturing, Inspection, Scanning electron microscopy, Photomasks, Critical dimension metrology, Semiconducting wafers, Binary data

Showing 5 of 8 publications
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