Jeff J. Meute
Project Manager at Sematech Inc
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Author
Publications (15)

Proceedings Article | 21 March 2006
Proc. SPIE. 6154, Optical Microlithography XIX
KEYWORDS: Lithography, Lithographic illumination, Polarization, Birefringence, Imaging systems, Image resolution, 3D modeling, Refraction, Photomasks, 3D image processing

Proceedings Article | 28 June 2005
Proc. SPIE. 5853, Photomask and Next-Generation Lithography Mask Technology XII
KEYWORDS: Lithography, Lithographic illumination, Polarization, Birefringence, Imaging systems, Image resolution, 3D modeling, Refraction, Photomasks, 3D image processing

Proceedings Article | 28 May 2004
Proc. SPIE. 5377, Optical Microlithography XVII
KEYWORDS: Lithography, Monochromatic aberrations, Reticles, Birefringence, Error analysis, Manufacturing, Wavefronts, Optical alignment, Phase measurement, Optics manufacturing

Proceedings Article | 14 May 2004
Proc. SPIE. 5376, Advances in Resist Technology and Processing XXI
KEYWORDS: Lithography, Contamination, Statistical analysis, Spectroscopy, Scanning electron microscopy, Photoresist materials, Photoresist processing, Semiconducting wafers, Environmental sensing, Real-time computing

Proceedings Article | 17 December 2003
Proc. SPIE. 5256, 23rd Annual BACUS Symposium on Photomask Technology
KEYWORDS: Reticles, Phase shifting, Polarization, Etching, Scanning electron microscopy, Photomasks, Critical dimension metrology, Neodymium, Semiconducting wafers, Phase shifts

Proceedings Article | 26 June 2003
Proc. SPIE. 5040, Optical Microlithography XVI
KEYWORDS: Monochromatic aberrations, Etching, Image processing, Image analysis, Scanning electron microscopy, Photomasks, Phase measurement, Critical dimension metrology, Semiconducting wafers, Phase shifts

Showing 5 of 15 publications
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