Mr. Jefferson O. Nemelka
at Toppan Photomasks Inc
SPIE Involvement:
Author
Publications (1)

PROCEEDINGS ARTICLE | December 17, 2003
Proc. SPIE. 5256, 23rd Annual BACUS Symposium on Photomask Technology
KEYWORDS: Diffractive optical elements, Etching, Electrodes, Error analysis, Ions, Plasmas, Inspection, Signal processing, Photomasks, Reactive ion etching

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