Dr. Jeffery Hodges
at
SPIE Involvement:
Author
Publications (1)

PROCEEDINGS ARTICLE | March 24, 2016
Proc. SPIE. 9778, Metrology, Inspection, and Process Control for Microlithography XXX
KEYWORDS: Diffraction, Optical design, Light sources, Metrology, Polarization, Inspection, Reflectivity, Interference (communication), Scatterometry, Semiconducting wafers, Electromagnetic simulation, Overlay metrology, Device simulation

SIGN IN TO:
  • View contact details

UPDATE YOUR PROFILE
Is this your profile? Update it now.
Don’t have a profile and want one?

Back to Top