Dr. Jeffrey D. Byers
Research Scientist at SEMATECH Inc
SPIE Involvement:
Author
Publications (65)

SPIE Journal Paper | 1 January 2009
JM3 Vol. 8 Issue 01
KEYWORDS: Lithography, Picture Archiving and Communication System, Photomasks, Nonlinear response, Computer simulations, Imaging systems, Photons, Electroluminescence, Photoresist developing, Absorbance

Proceedings Article | 15 April 2008
Proc. SPIE. 6923, Advances in Resist Materials and Processing Technology XXV
KEYWORDS: Oxides, Refractive index, Transparency, Nanoparticles, Metals, Water, Ultraviolet radiation, Absorbance, Nanocomposites, Polarizability

Proceedings Article | 15 April 2008
Proc. SPIE. 6923, Advances in Resist Materials and Processing Technology XXV
KEYWORDS: Lithography, Refractive index, Nanoparticles, Polymers, Sulfur, Chemistry, Absorbance, Immersion lithography, Line edge roughness, Chlorine

Proceedings Article | 1 April 2008
Proc. SPIE. 6924, Optical Microlithography XXI
KEYWORDS: Wafer-level optics, Prisms, Optical lithography, Polarization, Imaging systems, Remote sensing, Reflectivity, Photomasks, Double patterning technology, Semiconducting wafers

Proceedings Article | 1 April 2008
Proc. SPIE. 6924, Optical Microlithography XXI
KEYWORDS: Lithography, Optical lithography, Imaging systems, Computer simulations, Electroluminescence, Photomasks, Double patterning technology, Semiconducting wafers, Nonlinear response, Resolution enhancement technologies

Proceedings Article | 28 March 2008
Proc. SPIE. 6921, Emerging Lithographic Technologies XII
KEYWORDS: Photons, X-rays, Quantum efficiency, Coating, Photoresist materials, Reflectometry, Extreme ultraviolet, Absorbance, Extreme ultraviolet lithography, Line edge roughness

Showing 5 of 65 publications
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