Dr. Jeffrey Mileham
at Veeco Instruments Inc
SPIE Involvement:
Publications (5)

Proceedings Article | 26 March 2019 Paper
Richard van Haren, Ronald Otten, Subodh Singh, Amandev Singh, Leon van Dijk, David Owen, Doug Anberg, Jeffrey Mileham, Yajun Gu, Jan Hermans
Proceedings Volume 10959, 109591I (2019) https://doi.org/10.1117/12.2515391
KEYWORDS: Semiconducting wafers, Distortion, Scanners, Optical alignment, Silicon, Overlay metrology, Etching, Performance modeling, Silicon films, Annealing

Proceedings Article | 28 March 2017 Presentation + Paper
Sungtae Kim, Frida Liang, Jeffrey Mileham, Damon Tsai, Eric Bouche, Sean Lee, Albert Huang, C. F. Hua, Ming Sheng Wei
Proceedings Volume 10145, 101450P (2017) https://doi.org/10.1117/12.2257799
KEYWORDS: Semiconducting wafers, Manufacturing, Lithography, Process control, Metrology, Overlay metrology, Interferometry, Distortion, Chemical mechanical planarization, Inspection, Data modeling, Oxides

Proceedings Article | 28 March 2017 Paper
Leon van Dijk, Jeffrey Mileham, Ilja Malakhovsky, David Laidler, Harold Dekkers, Sven Van Elshocht, Doug Anberg, David Owen, Richard van Haren
Proceedings Volume 10145, 101452L (2017) https://doi.org/10.1117/12.2257475
KEYWORDS: Lithographic process control, Forward error correction, Distortion, Lithographic metrology, Semiconducting wafers, Overlay metrology, Scanners, Metrology, Thin films, Process control, Silicon films, Semiconductor manufacturing

Proceedings Article | 24 March 2016 Paper
Jeffrey Mileham, Yasushi Tanaka, Doug Anberg, David Owen, Byoung-Ho Lee, Eric Bouche
Proceedings Volume 9778, 97782W (2016) https://doi.org/10.1117/12.2220531
KEYWORDS: Overlay metrology, Lithography, Process control, Interferometry, Optical lithography, Semiconductors, Distortion, High volume manufacturing, Semiconducting wafers, Data modeling, Scanners

Proceedings Article | 8 March 2016 Paper
Proceedings Volume 9778, 977831 (2016) https://doi.org/10.1117/12.2220479
KEYWORDS: Interferometry, Semiconducting wafers, Process control, Semiconductors, Image processing, Control systems, Manufacturing, Defect inspection, Inspection, Overlay metrology, Scanners, Interferometers

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